scholarly journals Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

2017 ◽  
Author(s):  
Seiji Nagahara ◽  
Michael Carcasi ◽  
Gosuke Shiraishi ◽  
Hisashi Nakagawa ◽  
Satoshi Dei ◽  
...  
Keyword(s):  
High Resolution ◽  
High Throughput ◽  
Acid Generation ◽  
Chemically Amplified ◽  
Euv Lithography ◽  
Flood Exposure ◽  
Chemically Amplified Resist

scholarly journals Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

2016 ◽  
Author(s):  
Seiji Nagahara ◽  
Michael Carcasi ◽  
Hisashi Nakagawa ◽  
Elizabeth Buitrago ◽  
Oktay Yildirim ◽  
...  
Keyword(s):  
Trade Off ◽  
Chemically Amplified ◽  
Euv Lithography ◽  
Flood Exposure ◽  
Chemically Amplified Resist

One-component chemically amplified resist composed of polymeric sulfonium salt PAGs for high resolution patterning

2019 ◽  
Vol 114 ◽  
pp. 11-18 ◽  
Author(s):  
Qianqian Wang ◽  
Chenying Zhang ◽  
Chenfeng Yan ◽  
Fengjuan You ◽  
Liyuan Wang
Keyword(s):  
High Resolution ◽  
Sulfonium Salt ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

scholarly journals Reduction of the Outgassing Segment in Acetal based Chemically Amplified Resist for EUV Lithography

2006 ◽  
Vol 19 (4) ◽  
pp. 533-538 ◽  
Author(s):  
Seiya Masuda ◽  
Yasutomo Kawanishi ◽  
Shuuji Hirano ◽  
Sou Kamimura ◽  
Kazuyoshi Mizutani ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Euv Lithography ◽  
Chemically Amplified Resist

Patterning performance of chemically amplified resist in EUV lithography

2016 ◽  
Author(s):  
Tatsuya Fujii ◽  
Shogo Matsumaru ◽  
Tomotaka Yamada ◽  
Yoshitaka Komuro ◽  
Daisuke Kawana ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Euv Lithography ◽  
Chemically Amplified Resist

Negative tone chemically amplified resist formulation optimizations for ultra high-resolution lithography

2003 ◽  
Vol 67-68 ◽  
pp. 274-282 ◽  
Author(s):  
J. Saint-Pol ◽  
S. Landis ◽  
C. Gourgon ◽  
S. Tedesco ◽  
R. Hanawa ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Negative Tone

A New Chemically Amplified Resist for High Resolution Patterning by E-Beam Lithography

2010 ◽  
Vol 10 (11) ◽  
pp. 7130-7133 ◽  
Author(s):  
Bing-Rui Lu ◽  
Yifang Chen ◽  
Ejaz Huq ◽  
Xin-Ping Qu ◽  
Ran Liu
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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