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EUV phase shift mask requirements for imaging at low-k1
Mapping Intimacies
◽
10.1117/12.2572355
◽
2020
◽
Author(s):
Frank J. Timmermans
◽
Claire van Lare
◽
Jo Finders
◽
Robert de Kruif
Keyword(s):
Phase Shift
◽
Phase Shift Mask
Download Full-text
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Relationship of phase shift mask design and size of three-dimension nanostructures
2020 27th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)
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10.23919/am-fpd49417.2020.9224493
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2020
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Author(s):
Pongsakom Sihapitak
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Yasuaki Ishikawa
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Xudongfang Wang
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Mutsunori Uenuma
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Keyword(s):
Phase Shift
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Three Dimension
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Phase Shift Mask
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Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask
Japanese Journal of Applied Physics
◽
10.1143/jjap.43.514
◽
2004
◽
Vol 43
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◽
pp. 514-517
Author(s):
Jai-Cheol Lee
◽
Yong-Ho Oh
◽
Sungwoo Lim
◽
Chun Soo Go
◽
Sung Su Roh
Keyword(s):
Monte Carlo
◽
Phase Shift
◽
Automatic Design
◽
Phase Shift Mask
Download Full-text
Preliminary study of 65 nm node alternating phase-shift mask fabrication
10.1117/12.467487
◽
2002
◽
Author(s):
Kouji Hosono
◽
Naoyuki Ishiwata
◽
Satoru Asai
◽
Hiroshi Maruyama
◽
Yutaka Miyahara
◽
...
Keyword(s):
Phase Shift
◽
Preliminary Study
◽
Phase Shift Mask
◽
Alternating Phase Shift Mask
◽
Mask Fabrication
Download Full-text
Application of alternating phase shift mask to device fabrication
10.1117/12.209281
◽
1995
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Cited By ~ 1
Author(s):
Sunggi Kim
◽
Sang-Gyun Woo
◽
Woo-Sung Han
◽
Young-Bum Koh
◽
Moon-Yong Lee
Keyword(s):
Phase Shift
◽
Device Fabrication
◽
Phase Shift Mask
◽
Alternating Phase Shift Mask
Download Full-text
Sidewall profile inclination modulation mask (SPIMM): modification of an attenuated phase-shift mask for single-exposure double and multiple patterning
10.1117/12.2008886
◽
2013
◽
Author(s):
Frederick T. Chen
◽
Wei-Su Chen
◽
Ming-Jinn Tsai
◽
Tzu-Kun Ku
Keyword(s):
Phase Shift
◽
Single Exposure
◽
Phase Shift Mask
Download Full-text
Second level exposure for phase shift mask applications using an SLM-based DUV mask writer
10.1117/12.617359
◽
2005
◽
Author(s):
Mahesh Chandramouli
◽
Bob Olshausen
◽
Yulia Korobko
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Sven Henrichs
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Ping Qu
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...
Keyword(s):
Phase Shift
◽
Phase Shift Mask
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Primary processes in e-beam and laser lithographies for phase-shift mask manufacturing II
10.1117/12.142150
◽
1993
◽
Author(s):
Masa-aki Kurihara
◽
Masumi Arai
◽
Hiroshi Fujita
◽
Hisashi Moro-oka
◽
Yoichi Takahashi
◽
...
Keyword(s):
Phase Shift
◽
Phase Shift Mask
Download Full-text
Effect of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet Lithography
Japanese Journal of Applied Physics
◽
10.1143/jjap.48.06fa06
◽
2009
◽
Vol 48
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◽
pp. 06FA06
◽
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Author(s):
Hyun-Duck Shin
◽
Chang Young Jeoung
◽
Tae Geun Kim
◽
Sangsul Lee
◽
In-Sung Park
◽
...
Keyword(s):
Phase Shift
◽
Extreme Ultraviolet
◽
Extreme Ultraviolet Lithography
◽
Ultraviolet Lithography
◽
Phase Shift Mask
Download Full-text
Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask
10.1117/12.867710
◽
2010
◽
Cited By ~ 2
Author(s):
Yoshifumi Sakamoto
◽
Tomohito Hirose
◽
Hitomi Tsukuda
◽
Taichi Yamazaki
◽
Yosuke Kojima
◽
...
Keyword(s):
Phase Shift
◽
Radiation Damage
◽
193 Nm
◽
Phase Shift Mask
Download Full-text
Fine pattern fabrication property of binary mask and attenuated phase shift mask
10.1117/12.824307
◽
2009
◽
Cited By ~ 1
Author(s):
Taichi Yamazaki
◽
Yosuke Kojima
◽
Mitsuharu Yamana
◽
Takashi Haraguchi
◽
Tsuyoshi Tanaka
Keyword(s):
Phase Shift
◽
Binary Mask
◽
Fine Pattern
◽
Phase Shift Mask
Download Full-text
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