Effect of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet Lithography

2009 ◽  
Vol 48 (6) ◽  
pp. 06FA06 ◽  
Author(s):  
Hyun-Duck Shin ◽  
Chang Young Jeoung ◽  
Tae Geun Kim ◽  
Sangsul Lee ◽  
In-Sung Park ◽  
...  
2013 ◽  
Vol 6 (9) ◽  
pp. 096501 ◽  
Author(s):  
Seongchul Hong ◽  
Seejun Jeong ◽  
Jae Uk Lee ◽  
Seung Min Lee ◽  
Jinho Ahn

2006 ◽  
Author(s):  
Bruno La Fontaine ◽  
Adam R. Pawloski ◽  
Obert Wood ◽  
Yunfei Deng ◽  
Harry J. Levinson ◽  
...  

2003 ◽  
Vol 42 (Part 1, No. 5A) ◽  
pp. 2639-2648 ◽  
Author(s):  
Minoru Sugawara ◽  
Akira Chiba ◽  
Iwao Nishiyama

2004 ◽  
Author(s):  
Sang-In Han ◽  
Eric Weisbrod ◽  
James R. Wasson ◽  
Rich Gregory ◽  
Qianghua Xie ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document