Negative-type chemically amplified resists for ArF excimer laser lithography

1998 ◽  
Author(s):  
Takuya Naito ◽  
Makoto Takahashi ◽  
Takeshi Ohfuji ◽  
Masaru Sasago
Keyword(s):  
Excimer Laser ◽  
Negative Type ◽  
Laser Lithography ◽  
Chemically Amplified ◽  
Arf Excimer Laser ◽  
Chemically Amplified Resists

scholarly journals Positive and Negative Chemically Amplified Resists for Excimer Laser Lithography

1991 ◽  
Vol 59 (12) ◽  
pp. 1026-1030
Author(s):  
Nobuaki HAYASHI ◽  
Takumi UENO ◽  
Hiroshi SHIRAISHI ◽  
Leo SCHLEGEL ◽  
Takao IWAYANAGI
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Transparent photoacid generator (ALS) for ArF excimer laser lithography and chemically amplified resist

1994 ◽  
Author(s):  
Kaichiro Nakano ◽  
Katsumi Maeda ◽  
Shigeyuki Iwasa ◽  
Jun-ichi Yano ◽  
Yukio Ogura ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Arf Excimer Laser ◽  
Photoacid Generator

scholarly journals Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

1997 ◽  
Vol 10 (4) ◽  
pp. 585-588 ◽  
Author(s):  
Young-long Kang ◽  
Haiwon Lee ◽  
Eung-Ryul Kim ◽  
Sang-Jun Choi ◽  
Chun-Geun Park
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Chemically Amplified ◽  
Arf Excimer Laser

scholarly journals Resists Using the Absorption Band Shift Method for ArF Excimer Laser Lithography.

1998 ◽  
Vol 11 (3) ◽  
pp. 489-492
Author(s):  
Takeshi Okino ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi
Keyword(s):  
Absorption Band ◽  
Excimer Laser ◽  
Band Shift ◽  
Shift Method ◽  
Laser Lithography ◽  
Arf Excimer Laser
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