Prospect and challenges of ArF excimer laser lithography processes and materials

1996 ◽  
Vol 14 (6) ◽  
pp. 4203 ◽  
Author(s):  
T. Ohfuji
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser

scholarly journals Resists Using the Absorption Band Shift Method for ArF Excimer Laser Lithography.

1998 ◽  
Vol 11 (3) ◽  
pp. 489-492
Author(s):  
Takeshi Okino ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi
Keyword(s):  
Absorption Band ◽  
Excimer Laser ◽  
Band Shift ◽  
Shift Method ◽  
Laser Lithography ◽  
Arf Excimer Laser

ArF excimer laser lithography with bottom antireflective coating

1998 ◽  
Author(s):  
Shinji Kishimura ◽  
Makoto Takahashi ◽  
Keisuke Nakazawa ◽  
Takeshi Ohfuji ◽  
Masaru Sasago ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Antireflective Coating ◽  
Laser Lithography ◽  
Arf Excimer Laser

Dissolution behavior of alicyclic polymers designed for ArF excimer laser lithography

1996 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Katsumi Maeda ◽  
Kaichiro Nakano ◽  
Etsuo Hasegawa
Keyword(s):  
Excimer Laser ◽  
Dissolution Behavior ◽  
Laser Lithography ◽  
Arf Excimer Laser

scholarly journals Resist processes for ArF excimer laser lithography.

1993 ◽  
Vol 6 (4) ◽  
pp. 473-490 ◽  
Author(s):  
RODERICK R. KUNZ ◽  
MARK A. HARTNEY ◽  
MARK W. HORN ◽  
CRAIG L. KEAST ◽  
MORDECHAI ROTHSCHILD ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser

Synthesis of Silicon-Containing Photoresists for ArF Excimer Laser Lithography

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6869-6872 ◽  
Author(s):  
Young-Dae Kim ◽  
Sang-Jin Park ◽  
Haiwon Lee ◽  
Eung-Ryul Kim ◽  
Sang-Jun Choi ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser
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