Measurement of hard pellicles for 157-nm lithography using Fourier transform phase-shifting interferometry

Author(s):  
Leslie L. Deck ◽  
Chris Van Peski ◽  
Richard D. Eandi
2019 ◽  
Vol 27 (3) ◽  
pp. 2713 ◽  
Author(s):  
Jiaming Qian ◽  
Tianyang Tao ◽  
Shijie Feng ◽  
Qian Chen ◽  
Chao Zuo

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