Design of the chirped multilayer mirrors in extreme ultraviolet region for ultrafast applications

2010 ◽  
Author(s):  
Fengli Wang ◽  
Lei Liu ◽  
Jingtao Zhu ◽  
Zhong Zhang ◽  
Wenbin Li ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Ultraviolet Region ◽  
Multilayer Mirrors

scholarly journals Metrological studies of the characteristics of multilayer surface coatings using synchrotron radiation

2021 ◽  
Vol 9 (1) ◽  
pp. 38-47
Author(s):  
A. S. Sigov ◽  
O. A. Minaeva ◽  
S. I. Anevsky ◽  
A. M. Lebedev ◽  
R. V. Minaev
Keyword(s):  
Synchrotron Radiation ◽  
Reflection Coefficient ◽  
Photon Energy ◽  
Extreme Ultraviolet ◽  
Ultraviolet Region ◽  
Optical Scheme ◽  
Multilayer Mirrors ◽  
Spectral Reflection ◽  
Adopted Model ◽  
Spectral Reflection Coefficient

The investigations of multilayer surface nanostructures characteristics was performed with synchrotron radiation sources, characterized by an intensive, calculated continuum. It plays an important role in nanoelectronics metrological base. The main research were carried out at electron storage rings «Siberia-1» (Kurchatov Institute) and MLS (PTB, Berlin) with low electron energy, in a wide wavelength range, including visible range, AUV, VU, EUV and to exclude the X-ray radiation influence. The methods of the radiometers, photodiodes, filters and multilayer mirrors characteristics measurements are based on the synchrotron  radiation  absolute spectral characteristics and accelerated electrons number variation. The metrological investigations with synchrotron radiation was concentrated on: – absolute spectral responsivety of silicon photodiodes with multilayer filters for integral radiometers applications; – spectral transmittances of surface layers of photodiodes in the extreme ultraviolet region; – spectral reflectance coefficient of superlattice. The characteristics of photodiodes and filters on a synchrotron radiation source are measured using a monochromator and a reference detector. The use of a synchrotron radiation channel makes it possible to study the spectral transmittance of thin films and multilayer structures formed in the in situ mode. To form multilayer nanostructures directly on the receiving surface of photodetectors, an ion-plasma sputtering module is used. The optical scheme of the channel provides for the possibility of using monochromators of grazing incidence for the range of photon energies from 25 to 100 ev and normal incidence for the range of photon energies from 4 to 25 ev. At a photon energy of 40 ev, the absolute spectral sensitivity was 70 ma / W for a photodiode with a surface multilayer filter applied. To develop an experimental technique for measuring the spectral reflection coefficient of multilayer mirrors, and to create standard samples, the Mo/Si  system was studied. Computer modeling of multi-layer coatings allows us to calculate the optical characteristics of superlattices in the extreme ultraviolet region. The obtained results of measurements of the spectral reflection coefficient of a multilayer coating in the photon energy range of 65–100 ev indicate a resonance reflection character with a max-imum at an energy of 83.5 ev and an energy width at a half-height of about 6.5 ev. The working wave-length of the reflecting mirror corresponds to the calculated one, which confirms the effectiveness of the adopted model.

Effect of energetic electron and proton bombardment on the reflectance of silicon-carbide mirrors in the extreme-ultraviolet region

1994 ◽  
Vol 33 (25) ◽  
pp. 5902 ◽  
Author(s):  
G. E. Holland ◽  
J. F. Seely ◽  
R. P. McCoy ◽  
K. F. Dymond ◽  
C. Rollins ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Extreme Ultraviolet ◽  
Energetic Electron ◽  
Ultraviolet Region ◽  
Proton Bombardment

scholarly journals Phase-matched four-wave mixing in the extreme ultraviolet region

2018 ◽  
Vol 124 (1) ◽  
pp. 015901 ◽  
Author(s):  
Khoa Anh Tran ◽  
Khuong Ba Dinh ◽  
Peter Hannaford ◽  
Lap Van Dao
Keyword(s):  
Extreme Ultraviolet ◽  
Four Wave Mixing ◽  
Ultraviolet Region ◽  
Wave Mixing

Wave-Front Quality Analysis of Three-Dimension Pinhole Vector Diffractional in Extreme Ultraviolet Region

2010 ◽  
Vol 30 (10) ◽  
pp. 2849-2854 ◽  
Author(s):  
卢增雄 Lu Zengxiong ◽  
金春水 Jin Chunshui ◽  
张立超 Zhang Lichao ◽  
王丽萍 Wang Liping
Keyword(s):  
Wave Front ◽  
Extreme Ultraviolet ◽  
Quality Analysis ◽  
Ultraviolet Region ◽  
Three Dimension

Beryllium-Based Multilayer Mirrors for the Soft X-Ray and Extreme Ultraviolet Wavelength Ranges

2020 ◽  
Vol 14 (1) ◽  
pp. 124-134 ◽  
Author(s):  
Yu. A. Vainer ◽  
S. A. Garakhin ◽  
S. Yu. Zuev ◽  
A. N. Nechay ◽  
R. S. Pleshkov ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Multilayer Mirrors ◽  
X Ray ◽  
Ultraviolet Wavelength

Metrology Related to the Multilayer Mirrors in an Extreme-Ultraviolet Stepper

2007 ◽  
Author(s):  
C. Tarrio ◽  
S. B. Hill ◽  
I. Ermanoski ◽  
T. B. Lucatorto ◽  
T. E. Madey ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Multilayer Mirrors

Upgrade of beamline BL08B at Taiwan Light Source from a photon-BPM to a double-grating SGM beamline

2015 ◽  
Vol 22 (5) ◽  
pp. 1312-1318 ◽  
Author(s):  
Jih-Young Yuh ◽  
Shan-Wei Lin ◽  
Liang-Jen Huang ◽  
Hok-Sum Fung ◽  
Long-Life Lee ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Solar Physics ◽  
Emission Spectra ◽  
Ultraviolet Region ◽  
Extreme Ultraviolet Lithography ◽  
Beam Position ◽  
Ultraviolet Lithography ◽  
X Ray ◽  
Nano Fabrication ◽  
Grating Monochromator

During the last 20 years, beamline BL08B has been upgraded step by step from a photon beam-position monitor (BPM) to a testing beamline and a single-grating beamline that enables experiments to record X-ray photo-emission spectra (XPS) and X-ray absorption spectra (XAS) for research in solar physics, organic semiconductor materials and spinel oxides, with soft X-ray photon energies in the range 300–1000 eV. Demands for photon energy to extend to the extreme ultraviolet region for applications in nano-fabrication and topological thin films are increasing. The basic spherical-grating monochromator beamline was again upgraded by adding a second grating that delivers photons of energy from 80 to 420 eV. Four end-stations were designed for experiments with XPS, XAS, interstellar photoprocess systems (IPS) and extreme-ultraviolet lithography (EUVL) in the scheduled beam time. The data from these experiments show a large count rate in core levels probed and excellent statistics on background normalization in theL-edge adsorption spectrum.

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