EMISSIVITY MEASUREMENTS FOR HOT PLANETARY SURFACES

2017 ◽  
Author(s):  
M. Darby Dyar ◽  
◽  
Jörn Helbert ◽  
Alessandro Maturilli ◽  
Sabrina Ferrari ◽  
...  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Albert Adibekyan ◽  
Elena Kononogova ◽  
Jacques Hameury ◽  
Marcus Lauenstein ◽  
Christian Monte ◽  
...  

Abstract The development and use of new thermal insulation products in many industrial sectors, ranging from building insulations to power generation or satellite applications, requires the accurate knowledge of the radiative properties of the investigated material, i. e. its emissivity. A major objective of the research project “Improvement of emissivity measurements on reflective insulation materials” within the framework of the European Metrology Programme for Innovation and Research was to improve and validate reference techniques for the measurement of the total hemispherical emissivity of low emissivity foils with an absolute measurement uncertainty below 0.03. The calibration and measurement procedures developed within this project shall lead to a significant benefit for industrial manufacturers of reflective foils as well as for the end-users of the industrial instruments used to characterize them.


1976 ◽  
Vol 14 (3) ◽  
pp. 141-153 ◽  
Author(s):  
E. Haines ◽  
J. Arnold ◽  
A. Metzger

Sensors ◽  
2016 ◽  
Vol 16 (11) ◽  
pp. 1952 ◽  
Author(s):  
Affan Shaukat ◽  
Peter Blacker ◽  
Conrad Spiteri ◽  
Yang Gao

1982 ◽  
Vol 87 (B8) ◽  
pp. 6668-6680 ◽  
Author(s):  
John D. O'Keefe ◽  
Thomas J. Ahrens
Keyword(s):  

2012 ◽  
Vol 117 (E12) ◽  
pp. n/a-n/a ◽  
Author(s):  
Kerri L. Donaldson Hanna ◽  
Michael B. Wyatt ◽  
Ian R. Thomas ◽  
Neil E. Bowles ◽  
Benjamin T. Greenhagen ◽  
...  

1991 ◽  
Vol 224 ◽  
Author(s):  
C. Schietinger ◽  
B. Adams ◽  
C. Yarling

AbstractA novel wafer temperature and emissivity measurement technique for rapid thermal processing (RTP) is presented. The ‘Ripple Technique’ takes advantage of heating lamp AC ripple as the signature of the reflected component of the radiation from the wafer surface. This application of Optical Fiber Thermometry (OFT) allows high speed measurement of wafer surface temperatures and emissivities. This ‘Ripple Technique’ is discussed in theoretical and practical terms with wafer data presented. Results of both temperature and emissivity measurements are presented for RTP conditions with bare silicon wafers and filmed wafers.


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