RF plasma chemical vapor deposition of SiN x :H films

2012 ◽  
Vol 48 (8) ◽  
pp. 808-812 ◽  
Author(s):  
O. I. Semenova ◽  
S. F. Devyatova
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Rf Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition

2001 ◽  
Vol 40 (Part 2, No. 6B) ◽  
pp. L631-L634 ◽  
Author(s):  
Takashi Hirao ◽  
Korekiyo Ito ◽  
Hiroshi Furuta ◽  
Yoke Khin Yap ◽  
Takashi Ikuno ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Rf Plasma ◽  
Plasma Chemical ◽  
Vertically Aligned Carbon Nanotubes ◽  
Plasma Chemical Vapor Deposition ◽  
Aligned Carbon Nanotubes ◽  
Vertically Aligned

Influence of the Plasma Condition on the Morphology of Vertically Aligned Carbon Nanotube Films Grown by RF Plasma Chemical Vapor Deposition

2003 ◽  
Vol 10 (04) ◽  
pp. 611-615 ◽  
Author(s):  
Takashi Ikuno ◽  
Syunji Takahashi ◽  
Kazunori Kamada ◽  
Shigeharu Ohkura ◽  
Shin-Ich Honda ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Carbon Nanotube ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Rf Plasma ◽  
Plasma Condition ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Self Bias ◽  
Vertically Aligned

Vertically aligned carbon nanotube (VACNT) films have been grown by RF plasma chemical vapor deposition (RF-PECVD) with a controlling plasma condition. From the in situ optical emission spectroscopy (OES) and self-bias measurements, we have investigated the relationship between the morphology of VACNTs and the plasma condition in PECVD. CH radical and atomic hydrogen peaks were prominent in the OES spectra of CH 4 plasma. The plasma condition was changed by varying the interelectrode distance in PECVD. With increasing interelectrode distance, the diameter and density of VACNTs increased as a result of the increase in plasma density, the fraction of CH radicals, and self-bias. It is likely that the fraction of CH radicals in plasma influences promotion of the growth of CNTs, while the self-bias induces their vertical alignment.

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