INCLINED SUBSTRATE DEPOSITED CeO2 FILMS BY ELECTRON BEAM EVAPORATION ON RANDOMLY ORIENTED METALLIC SUBSTRATE

A study on CeO 2 film growth on randomly oriented metallic substrate using lnclined Substrate Deposition (ISD) technique was performed in order to develop a biaxially aligned buffer layer for YBa 2 Cu 3 O 7-δ (YBCO) coated conductors. The influence of deposition parameters, as the substrate inclination angle α with respect to the CeO 2 vapor direction, deposition temperature and film thickness, on structural and morphological properties of the film was investigated. At substrate temperature between 200°C and 700°C a biaxial texture was observed for α ranging from 15° to 75°. The minimum value of the ϕ-scan full width at half maximum (FWHM) on (002) poles of about 13.5° was obtained for film 2 μm thick deposited at 200°C and α=55°. Morphological analyses on cross-sectioned samples revealed a columnar structure, typical for this deposition technique, with spaced grains and a tile like surface.

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DEVELOPMENT OF BUFFER LAYER STRUCTURES FOR YBa2Cu3O7-δ COATED CONDUCTORS ON TEXTURED Ni-V SUBSTRATE

International Journal of Modern Physics B ◽

10.1142/s0217979200003423 ◽

2000 ◽

Vol 14 (25n27) ◽

pp. 3128-3133

Author(s):

A. MANCINI ◽

V. BOFFA ◽

G. CELENTANO ◽

L. CIONTEA ◽

M. DAMASCENI ◽

...

Keyword(s):

Electron Beam ◽

Buffer Layer ◽

Electron Beam Evaporation ◽

Coated Conductors ◽

Morphological Properties ◽

Metallic Substrates ◽

Good Surface ◽

Layer Structures ◽

Continuous Surface ◽

Ybco Coated Conductors

Y 2 O 3 and MgO-based buffer layer architectures on non-magnetic cube textured Ni-V substrates were studied for YBa 2 Cu 3 O 7-δ (YBCO) coated conductors fabrication using both pulsed laser deposition and electron beam evaporation. The Y 2 O 3 films exhibited a biaxial texture with φ and ω-scans full width at half maximum (FWHM) of about 11° and 7° and a smooth and continuous surface. YBCO thick films deposited on CeO 2/ Y 2 O 3/ Ni-V and CeO 2/ Y 2 O 3/ NiO/Ni-V architectures were mainly c-axis oriented showing a T C(R=0) above 85 K. MgO films were grown by electron beam evaporation both directly on metallic substrates and with a Pd intermediate layer. The MgO films grown on Ni-V substrates show a good texture and good surface morphological properties. The MgO deposition on Pd buffered Ni-V substrate leads to films with better structural properties with respect to MgO deposition on bare Ni-V substrate, showing φ and ω-scans FWHM up to 8° and 5°, respectively. In spite of the interdiffusion between Pd buffer layer and Ni-V substrate, the MgO films preserve their structural and morphological properties when annealed at typical YBCO deposition temperature.

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Chemically deposited La2Zr2O7buffer layers for YBCO-coated conductors: film growth and microstructure

Superconductor Science and Technology ◽

10.1088/0953-2048/19/11/019 ◽

2006 ◽

Vol 19 (11) ◽

pp. 1200-1208 ◽

Cited By ~ 45

Author(s):

L Molina ◽

K Knoth ◽

S Engel ◽

B Holzapfel ◽

O Eibl

Keyword(s):

Film Growth ◽

Coated Conductors ◽

Ybco Coated Conductors

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High Jc YBCO coated conductors on non-magnetic metallic substrate using YSZ-based buffer layer architecture

Physica C Superconductivity ◽

10.1016/s0921-4534(02)00908-5 ◽

2002 ◽

Vol 372-376 ◽

pp. 790-793 ◽

Cited By ~ 7

Author(s):

G. Celentano ◽

V. Boffa ◽

L. Ciontea ◽

F. Fabbri ◽

V. Galluzzi ◽

...

Keyword(s):

Buffer Layer ◽

Metallic Substrate ◽

Coated Conductors ◽

Ybco Coated Conductors

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Grain growth and biaxial texture of chemically deposited La2Zr2O7buffer layers for YBCO-coated conductors

Journal of Physics Conference Series ◽

10.1088/1742-6596/97/1/012108 ◽

2008 ◽

Vol 97 ◽

pp. 012108 ◽

Cited By ~ 7

Author(s):

L Molina ◽

S Engel ◽

K Knoth ◽

R Hühne ◽

B Holzapfel ◽

...

Keyword(s):

Grain Growth ◽

Coated Conductors ◽

Biaxial Texture ◽

Ybco Coated Conductors

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Hetero-Epitaxy of Group Va Metals on Sapphire

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100095716 ◽

1972 ◽

Vol 30 ◽

pp. 492-493

Author(s):

J. E. O'Neal ◽

J. J. Bellina ◽

B. B. Rath

Keyword(s):

Thermal Contact ◽

High Vacuum ◽

Electron Beam Evaporation ◽

Ultra High Vacuum ◽

Backing Plate ◽

Sapphire Substrates ◽

Deposition Parameters ◽

Polishing Damage ◽

Reflection Electron Diffraction

Thin films of the bcc metals vanadium, niobium and tantalum were epitaxially grown on (0001) and sapphire substrates. Prior to deposition, the mechanical polishing damage on the substrates was removed by an in-situ etch. The metal films were deposited by electron-beam evaporation in ultra-high vacuum. The substrates were heated by thermal contact with an electron-bombarded backing plate. The deposition parameters are summarized in Table 1.The films were replicated and examined by electron microscopy and their crystallographic orientation and texture were determined by reflection electron diffraction. Verneuil-grown and Czochralskigrown sapphire substrates of both orientations were employed for each evaporation. The orientation of the metal deposit was not affected by either increasing the density of sub-grain boundaries by about a factor of ten or decreasing the deposition rate by a factor of two. The results on growth epitaxy are summarized in Tables 2 and 3.

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