Influence of Deposition Conditions on Properties of Hydrogenated Amorphous Silicon Prepared by RF Glow Discharge

1985 ◽  
Vol 24 (Part 1, No. 6) ◽  
pp. 639-645 ◽  
Author(s):  
Satoshi Nishikawa ◽  
Hiroaki Kakinuma ◽  
Tsukasa Watanabe ◽  
Koji Nihei
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Rf Glow Discharge ◽  
Hydrogenated Amorphous ◽  
Deposition Conditions

Efficient Boron Incorporation in Hydrogenated Amorphous Silicon Films by a Novel Combination of RF Glow Discharge Technique and Heated Filament

1995 ◽  
Vol 34 (Part 1, No. 10) ◽  
pp. 5743-5750 ◽  
Author(s):  
S. Chattopadhyay ◽  
Debabrata Das ◽  
S. N. Sharma ◽  
A K. Barua ◽  
Ratnabali Banerjee ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Silicon Films ◽  
Rf Glow Discharge ◽  
Hydrogenated Amorphous ◽  
Heated Filament

Hydrogenated Amorphous Silicon Germanium Alloys Prepared by Triode rf Glow Discharge

1986 ◽  
Vol 25 (Part 2, No. 4) ◽  
pp. L276-L278 ◽  
Author(s):  
Takeshige Ichimura ◽  
Takurou Ihara ◽  
Toshio Hama ◽  
Michio Ohsawa ◽  
Hiroshi Sakai ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Hydrogenated Amorphous Silicon ◽  
Rf Glow Discharge ◽  
Amorphous Silicon Germanium ◽  
Hydrogenated Amorphous ◽  
Silicon Germanium Alloys

Stability versus structure in glow discharge hydrogenated amorphous silicon obtained from a wide range of deposition conditions

1996 ◽  
Vol 198-200 ◽  
pp. 474-477 ◽  
Author(s):  
S. Vignoli ◽  
R. Meaudre ◽  
M. Meaudre ◽  
P. Roca i Cabarrocas ◽  
C. Godet ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Wide Range ◽  
Hydrogenated Amorphous ◽  
Deposition Conditions

Cowparison Studies of Hydrogenated Amorphous Silicon Films Prepared From Silane-Hydrogen and Silmne-Helium Mixtures

1986 ◽  
Vol 70 ◽  
Author(s):  
R. I. Patel ◽  
D. J. Olsen ◽  
J. R. Shirck ◽  
N. T. Tran
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Optical Emission ◽  
Gas Mixtures ◽  
Silicon Films ◽  
Helium Mixtures ◽  
Rf Glow Discharge ◽  
Powder Formation ◽  
Hydrogenated Amorphous

ABSTRACTHydrogenated amorphous silicon films were produced from silane/hydrogen and silane/helium gas mixtures by RF glow discharge. We examined the optical and electrical properties of films produced with these gas mixtures, at various RF power levels and silane fractions. Film quality was analyzed by measuring the dark and photoconductivity, optical band gap, and activation energy. Optical emission spectroscopy was also used as a diagnostic tool for studying the plasma during glow discharge depositions. Experimental results indicate that amorphous silicon films made from silane/helium mixtures exhibit improved optoelectronic properties, higher deposition rates, and higher emission intensity ratios (ISiH/IH) as compared to films produced from silane/hydrogen mixtures. In preparing films from silane/helium mixtures, the onset of dust/powder formation occurs at considerably higher RF powers as compared to silane/hydrogen, thus making this approach an attractive commercial option for depositing films at high rates.

A study of hydrogenated amorphous silicon deposited by rf glow discharge in silane‐hydrogen mixtures

1984 ◽  
Vol 56 (6) ◽  
pp. 1812-1820 ◽  
Author(s):  
P. E. Vanier ◽  
F. J. Kampas ◽  
R. R. Corderman ◽  
G. Rajeswaran
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Rf Glow Discharge ◽  
Hydrogen Mixtures ◽  
Hydrogenated Amorphous

Optical switching in hydrogenated amorphous silicon–sulfur alloy prepared by glow discharge

2004 ◽  
Vol 345-346 ◽  
pp. 302-305 ◽  
Author(s):  
S. Al-Dallal ◽  
F.Z. Henari ◽  
S.M. Al-Alawi ◽  
S.R. Arekat ◽  
H. Manaa
Keyword(s):  
Glow Discharge ◽  
Amorphous Silicon ◽  
Optical Switching ◽  
Hydrogenated Amorphous Silicon ◽  
Hydrogenated Amorphous
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