Strain Relaxed High Quality Silicon–Germanium-on-Insulator Substrates Formed by Pulsed Laser Irradiation Technology
Keyword(s):
1983 ◽
Vol 44
(C5)
◽
pp. C5-449-C5-454
◽
Keyword(s):
1983 ◽
Vol 44
(C5)
◽
pp. C5-23-C5-36
◽
Keyword(s):
Keyword(s):
Keyword(s):