Providing a Specified Level of Electromagnetic Shielding with Nickel Thin Films Formed by DC Magnetron Sputtering

Nickel films of 4–250 nm thickness were produced by DC magnetron sputtering onto glass and silicon substrates. The electrical properties of the films were investigated by the four-probe method and the surface morphology of the films was studied by atomic force microscopy. To measure the shielding effectiveness, a portable closed stand based on horn antennas was used. A theoretical assessment of the shielding effectiveness of nickel films of various thickness under electromagnetic radiation of a range of frequencies was carried out using two different approximations. The results demonstrate the shielding effectiveness of up to 35 dB of the nickel thin films in the frequency range of 2–18 GHz.

Transverse susceptibility of nickel thin films with uniaxial anisotropy

A finite temperature Stoner–Wohlfarth model has been used to calculate the transverse susceptibility of an ensemble of ferromagnetic particles with distributed anisotropy. The simulated transverse susceptibility is in excellent agreement with data acquired from thin film samples of elemental nickel, deposited on 128° Y-cut LiNb03. A strong, well-defined, uniaxial anisotropy is induced in the nickel film by low temperature annealing. Three peaks in the transverse susceptibility are observed in both the measured and simulated data when the applied field is misaligned with the hard axis by a few degrees. Two broad, reversible peaks occur when the applied field is equal to the anisotropy field. A single, sharp irreversible peak occurs when the absolute value of the applied field is less than the anisotropy field, and is associated with a metastable magnetic state. The irreversible peak disappears when the applied field is well aligned with the hard axis. The observed transverse susceptibility is consistent with the theoretical predictions of Aharoni et al. and is therefore consistent with the Stoner–Wohlfarth model.

Facile and scalable fabrication of nanostructured nickel thin film electrodes for electrochemical detection of formaldehyde

A rapid and scalable fabrication of metallic nickel thin films on a FTO substrate has been demonstrated to perform the electrochemical detection of formaldehyde.

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce unique properties in ferromagnetic thin films. Earlier we have explored the properties of polycrystalline and epitaxially deposited permalloy thin films deposited under 35° tilt using HiPIMS and compared it with films deposited by dc magnetron sputtering (dcMS). The films prepared by HiPIMS present lower anisotropy and coercivity fields than films deposited with dcMS. For the epitaxial films dcMS deposition gives biaxial anisotropy while HiPIMS deposition gives a well-defined uniaxial anisotropy. Results: We report on the deposition of 50 nm polycrystalline nickel thin films by dcMS and HiPIMS while the tilt angle with respect to the substrate normal is varied from 0° to 70°. The HiPIMS-deposited films are always denser, with a smoother surface and are magnetically softer than the dcMS-deposited films under the same deposition conditions. The obliquely deposited HiPIMS films are significantly more uniform in terms of thickness. Cross-sectional SEM images reveal that the dcMS-deposited film under 70° tilt angle consists of well-defined inclined nanocolumnar grains while grains of HiPIMS-deposited films are smaller and less tilted. Both deposition methods result in in-plane isotropic magnetic behavior at small tilt angles while larger tilt angles result in uniaxial magnetic anisotropy. The transition tilt angle varies with deposition method and is measured around 35° for dcMS and 60° for HiPIMS. Conclusion: Due to the high discharge current and high ionized flux fraction, the HiPIMS process can suppress the inclined columnar growth induced by oblique angle deposition. Thus, the ferromagnetic thin films obliquely deposited by HiPIMS deposition exhibit different magnetic properties than dcMS-deposited films. The results demonstrate the potential of the HiPIMS process to tailor the material properties for some important technological applications in addition to the ability to fill high aspect ratio trenches and coating on cutting tools with complex geometries.