Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a Fabry-Perot interference filter
2003 ◽
Vol 42
(Part 1, No. 5A)
◽
pp. 2639-2648
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Keyword(s):
2009 ◽
Vol 48
(6)
◽
pp. 06FA06
◽
2009 ◽
Vol 27
(6)
◽
pp. 2361
◽