Rotatable Anisotropy and Perpendicular Anisotropy of Annealed Electrodeposited Nickel Films

1969 ◽  
Vol 8 (6) ◽  
pp. 808-808 ◽  
Author(s):  
Hiroshi Maeda
1968 ◽  
Vol 39 (1) ◽  
pp. 201-204 ◽  
Author(s):  
A. F. Mayadas ◽  
E. Klokholm

1977 ◽  
Vol 16 (8) ◽  
pp. 1469-1470
Author(s):  
Yasuo Gondō ◽  
Hiroshi Konno ◽  
Isamu Sato ◽  
Akitsuna Yuhara

Author(s):  
K. Attenborough ◽  
J. De Boeck ◽  
J.-P. Celis ◽  
M. Mizuguchi ◽  
H. Akinaga

2011 ◽  
Vol 335-336 ◽  
pp. 1443-1447 ◽  
Author(s):  
Watcharee Rattanasakulthong ◽  
Pichai Sirisangsawang ◽  
Supree Pinitsoontorn ◽  
Chitnarong Sirisathitkul

Nickel films of varying thicknesses between 70 and 300 nm were deposited on glass substrates by RF sputtering and their broad (111) FCC peaks were identified by X-ray diffraction. The surface roughness and sub-micron grains were revealed by scanning electron microscopy. According to vibrating sample magnetometry, the films showed hysteresis loops with comparable coercive field and saturation field for the in-plane and perpendicular magnetizations. The increase in thickness substantially increased the magnetization and the squareness of the Ni films. The thickness can be classified into 2 regimes by the variation of squareness. The films are thinner than 200 nm showed the in-plane anisotropy whereas the perpendicular anisotropy was developed in the case of the thickness above 200 nm.


Sign in / Sign up

Export Citation Format

Share Document