Quantitative Analysis of Arsenic Element in a Trace of Water Using Total Reflection X-ray Fluorescence Spectrometry
Keyword(s):
Various kinds of compounds containing arsenic have been used in the world as rat poisons, agricultural chemicals and so on. In the field of semiconductor materials, AsH3 is used as a doping gas on silieon-wafer substrates and GaAs is now also investigated as a wafer substrate instead of Si wafer.As for quantitative analysis of arsenic, atomic absorption spectrometry (AAS) and inductively coupled plasma atomic-emission spectrometry (ICP-AES) have often been used. In these methods, usually, oomplioated pretreatments such as preconcentration and separation have been needed in order to obtain reproducible values for arsenic.
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