Characterization of higher harmonic modes in Fabry–Pérot microcavity organic light emitting diodes

Encasing an OLED between two planar metallic electrodes creates a Fabry–Pérot microcavity, resulting in significant narrowing of the emission bandwidth. The emission from such microcavity OLEDs depends on the overlap of the resonant cavity modes and the comparatively broadband electroluminescence spectrum of the organic molecular emitter. Varying the thickness of the microcavity changes the mode structure, resulting in a controlled change in the peak emission wavelength. Employing a silicon wafer substrate with high thermal conductivity to dissipate excess heat in thicker cavities allows cavity thicknesses from 100 to 350 nm to be driven at high current densities. Three resonant modes, the fundamental and first two higher harmonics, are characterized, resulting in tunable emission peaks throughout the visible range with increasingly narrow bandwidth in the higher modes. Angle resolved electroluminescence spectroscopy reveals the outcoupling of the TE and TM waveguide modes which blue-shift with respect to the normal emission at higher angles. Simultaneous stimulation of two resonant modes can produce dual peaks in the violet and red, resulting in purple emission. These microcavity-based OLEDs employ a single green molecular emitter and can be tuned to span the entire color gamut, including both the monochromatic visible range and the purple line.

Synchronizing Gas Injections and Time-Resolved Data Acquisition for Perturbation-Enhanced APXPS Experiments

An experimental approach is described in which well-defined perturbations of the gas feed into an Ambient Pressure X-Ray Photoelectron Spectroscopy (APXPS) cell are fully synchronized with the time-resolved XPS data acquisition. These experiments unlock new possibilities for investigating the properties of materials and chemical reactions mediated by their surfaces, such as those in heterogeneous catalysis, surface science, and coating/deposition applications. Implementation of this approach, which is termed perturbation-enhanced APXPS, at the SPECIES beamline of MAX IV Laboratory is discussed along with several experimental examples including individual pulses of N2 gas over Au foil, a multi-pulse titration of oxygen vacancies in a pre-reduced TiO2 single crystal with O2 gas, and a sequence of alternating precursor pulses for Atomic Layer Deposition (ALD) of TiO2 on a silicon wafer substrate.

Synchronizing Gas Injections and Time-Resolved Data Acquisition for Perturbation-Enhanced APXPS Experiments

An experimental approach is described in which well-defined perturbations of the gas feed into an Ambient Pressure X-Ray Photoelectron Spectroscopy (APXPS) cell are digitally synchronized with time-resolved XPS data acquisition with a Delay Line Detector (DLD). These experiments unlock new possibilities for investigating the properties of materials and chemical reactions mediated by their surfaces, such as those in heterogeneous catalysis, surface science, and coating/deposition applications. Implementation of this approach, which is termed perturbation-enhanced APXPS, at the SPECIES beamline of MAX-IV Laboratory is discussed along with several experimental examples including (1) individual pulses of N2 gas over Au foil, a multi-pulse titration of oxygen vacancies in a pre-reduced TiO2 single crystal with O2 gas, and a sequence of alternating precursor pulses for Atomic Layer Deposition (ALD) of TiO2 on a silicon wafer substrate.<br>

Synchronizing Gas Injections and Time-Resolved Data Acquisition for Perturbation-Enhanced APXPS Experiments

An experimental approach is described in which well-defined perturbations of the gas feed into an Ambient Pressure X-Ray Photoelectron Spectroscopy (APXPS) cell are digitally synchronized with time-resolved XPS data acquisition with a Delay Line Detector (DLD). These experiments unlock new possibilities for investigating the properties of materials and chemical reactions mediated by their surfaces, such as those in heterogeneous catalysis, surface science, and coating/deposition applications. Implementation of this approach, which is termed perturbation-enhanced APXPS, at the SPECIES beamline of MAX-IV Laboratory is discussed along with several experimental examples including (1) individual pulses of N2 gas over Au foil, a multi-pulse titration of oxygen vacancies in a pre-reduced TiO2 single crystal with O2 gas, and a sequence of alternating precursor pulses for Atomic Layer Deposition (ALD) of TiO2 on a silicon wafer substrate.<br>

Measurement of Intrinsic Hardness of Deposited Chromium Thin Films by Nanoindentation Method and Influencing Factors

Materials with very small dimensions exhibit different physical and mechanical properties compared to their bulk counterparts. This becomes significantly important for the thin films that are widely used as components in micro-electronics and functional materials. In this study, a chromium (Cr) thin film was deposited on a silicon (Si) wafer by DC-magnetron sputtering. The intrinsic hardness of the Cr thin film on Si-wafer was evaluated by the nanoindentation method. We especially investigated ways of measuring the intrinsic hardness of the Cr thin film, and influential factors including the substrate effect and surface roughness effect. To further characterize the intrinsic hardness of the Cr thin film on Si-wafer, we used Xray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). Two additional methods, the Meyer-plot and a profile for hardness versus indentation depth, were also employed. As a result of these two methods, we found that the profile for hardness versus indentation depth was valuable for evaluating the intrinsic hardness of Cr thin film on a Si-wafer substrate. The measured intrinsic hardness of the Cr thin film and Si wafer were about 900 Hv and 1143 Hv, respectively. The profile for hardness versus indentation depth can be widely used to evaluate the intrinsic hardness of metallic thin films on substrates.