On the Initial Sticking Coefficient of Molecules Requiring an Ensemble of Adsorption Sites onto Alloy Catalyst (100) Surfaces / Der Anfangshaftkoeffizient von Molekülen, die zur Adsorption ein Ensemble von Plätzen benötigen, auf (100)-Flächen von Legierungen

1990 ◽  
Vol 81 (9) ◽  
pp. 684-689
Author(s):  
Ingomar Jäger
Keyword(s):  
Sticking Coefficient ◽  
Adsorption Sites ◽  
Initial Sticking ◽  
Alloy Catalyst

Ion Beam assisted Deposition of Titanium Nitride

1988 ◽  
Vol 128 ◽  
Author(s):  
G. K. Hubler ◽  
D. Vanvechten ◽  
E. P. Donovan ◽  
R. A. Kant
Keyword(s):  
Titanium Nitride ◽  
Partial Pressure ◽  
Ion Beam ◽  
Surface Adsorption ◽  
Active Surface ◽  
Sticking Coefficient ◽  
Adsorption Sites ◽  
Ion Beam Assisted Deposition ◽  
Nitrogen Ions ◽  
Ambient Gas

ABSTRACTThe composition of titanium nitride films prepared by ion beam assisted deposition was studied as a function of the partial pressure of N2 gas in the deposition volume, and as a function of the impingement 'ratio of nitrogen ions (500 eV) to evaporated titanium atoms. The amount of nitrogen incorporated from the ambient gas was derived by subtraction of the fraction introduced by the ion beam. It is shown that the primary effects of ion bombardment are an increase in the sticking coefficient and a reduction in the number of active surface adsorption sites.

Energy and angle dependence of the initial sticking coefficient of O2 on Ag(001)

1996 ◽  
Vol 363 (1-3) ◽  
pp. 68-72 ◽  
Author(s):  
F.Buatier de Mongeot ◽  
M. Rocca ◽  
U. Valbusa
Keyword(s):  
Sticking Coefficient ◽  
Angle Dependence ◽  
Initial Sticking

Initial sticking coefficient of O2 on Ag (001)

1990 ◽  
Vol 54-55 ◽  
pp. 131-141 ◽  
Author(s):  
M. Rocca ◽  
P. Traversaro ◽  
U. Valbusa
Keyword(s):  
Sticking Coefficient ◽  
Initial Sticking

Initial sticking coefficient of O2 on Ag(110)

1994 ◽  
Vol 101 (1) ◽  
pp. 713-725 ◽  
Author(s):  
L. Vattuone ◽  
M. Rocca ◽  
C. Boragno ◽  
U. Valbusa
Keyword(s):  
Sticking Coefficient ◽  
Initial Sticking

OXYGEN AND POTASSIUM ADSORPTION ON A CARBIDE-MODIFIED STEPPED-W(100) IN CONTACT WITH THE CARBON SOLID SOLUTION: AN AES AND WF STUDY AT 300 K AND AT ELEVATED TEMPERATURES

2005 ◽  
Vol 12 (05n06) ◽  
pp. 787-792
Author(s):  
S. D. FOULIAS ◽  
A. PERDIKIS ◽  
D. VLACHOS
Keyword(s):  
Solid Solution ◽  
Elevated Temperatures ◽  
Dissociative Adsorption ◽  
Dispersed Phase ◽  
Phase System ◽  
Sticking Coefficient ◽  
Two Phase ◽  
Metallic Behavior ◽  
Initial Sticking ◽  
Carbon System

The adsorption of oxygen and potassium on the two-phase system: carbide-modified stepped- W (100) surface (CMT) in contact with the solid solution of carbon in bulk tungsten, was investigated by AES and WF measurements. The CMT surface shows metallic behavior judging from its interaction with K . The expected dissociative adsorption of oxygen appears to occur with 1 - θ kinetics, possibly via a molecularly chemisorbed state. The "dispersed phase — two-phase" model is clearly applicable when oxygen adsorbs on the K -pre-covered carbide. The initial sticking coefficient of oxygen increases drastically from the dispersed to the condensed phase, at least four-fold with respect to s0 on the clean carbide. It is proposed that this two-phase carbon system can be advantageous compared with the bulk carbide since it can easily regenerate the surface if the latter is depleted from carbon.

scholarly journals Initial Sticking Coefficient of H2 on the Pd–Cu(111) Surface Alloy at very Low Coverages

2013 ◽  
Vol 0 (0) ◽  
pp. 1-10
Author(s):  
Daniel Farías ◽  
Marina Minniti ◽  
Amjad Al Taleb ◽  
Rodolfo Miranda
Keyword(s):  
Surface Alloy ◽  
Sticking Coefficient ◽  
Initial Sticking

ETHYLENE REACTIVITY WITH SILICON SURFACE

2004 ◽  
Vol 11 (01) ◽  
pp. 21-25 ◽  
Author(s):  
M.-A. ZAÏBI ◽  
J.-P. LACHARME
Keyword(s):  
Silicon Surface ◽  
Auger Electron ◽  
Low Energy ◽  
Second Step ◽  
Sticking Coefficient ◽  
Low Energy Electron Diffraction ◽  
Low Energy Electron ◽  
Electron Spectrometry ◽  
Property Changes ◽  
Initial Sticking

The clean Si (111)(7×7) surface has been exposed to ethylene ( C 2 H 4) doses, up to 7000 L (1 L =10-6 Torr ×1 s ) at most, under ultrahigh vacuum. The structural and electronic property changes of the surface have been studied by low energy electron diffraction (LEED), Auger electron spectrometry (AES) and photoemission yield spectroscopy (PYS). The interaction presents two types of kinetic adsorption, where the first is produced below 3000 L of C 2 H 4. In the first step, the ethylene molecule is adsorbed molecularly and the initial sticking coefficient S 0 is very low (S0≈2×10-3). At the saturation (≈ 5000–6000 L), the valence band is fitted by a power law (E — 4.42)2.5 eV .1,2 The surface is then a stronger scattering for photoemitted electrons. We attribute this result, produced at the second step of adsorption, to the C 2 H 4-π orbital and hydrogen liberated by this molecule, which break the Si – Si surface bonds.

Initial Sticking Coefficient of H2 on the Pd–Cu(111) Surface Alloy at very Low Coverages

2013 ◽  
Vol 227 (9-11) ◽  
Author(s):  
Daniel Farías ◽  
Marina Minniti ◽  
Amjad Al Taleb ◽  
Rodolfo Miranda
Keyword(s):  
Surface Alloy ◽  
Sticking Coefficient ◽  
Initial Sticking
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