Atomic layer deposition of nanoparticles on self-assembled monolayer modified silicon substrate

ABSTRACTAtomic layer deposition has attracted much attention recently in fabricating noble metal nanoparticles for a wide range of applications. We have explored synthesizing palladium nanoparticles via atomic layer deposition on self-assembled monolayers modified silicon substrate. Using alkyltrichlorosilanes as the passivating agents, our results show the method is capable of fabricating Pd nanoparticles with well controlled density and particle diameter on the modified silicon substrate.