Mobility-Lifetime Products in a-Si:H and the Dangling Bond Recombination Model

1992 ◽  
Vol 258 ◽  
Author(s):  
E. Morgado

ABSTRACTFermi level and light intensity dependences of electron and hole lifetimes have been calculated using a recombination model which considers positively correlated dangling bonds as the only localized states in the gap. The model equations have been solved numerically taking into account the non-equilibrium statistics of correlated electrons and the Fermi level dependence of the defect density. The results are in agreement with the anticorrelated behavior of the majority' and minority carrier μτ products observed in a-Si:H. The majority carrier lifetime is found to be more sensitive to the photogeneration rate than the minority carrier lifetime. The position of the Fermi level with respect to the energies of the D° and D- centers in the gap is a determinant factor of the (°τ)e/(μτ)h ratio.

1990 ◽  
Vol 198 ◽  
Author(s):  
M.M. Al-Jassim ◽  
R.K. Ahrenkiel ◽  
M.W. Wanlass ◽  
J.M. Olson ◽  
S.M. Vernon

ABSTRACTInP and GaInP layers were heteroepitaxially grown on (100) Si substrates by atmospheric pressure MOCVD. TEM and photoluminescence (PL) were used to measure the defect density and the minority carrier lifetime in these structures. The direct growth of InP on Si resulted in either polycrystalline or heavily faulted single-crystal layers. The use of GaAs buffer layers in InP/Si structures gave rise to significantly improved morphology and reduced the threading dislocation density. The best InP/Si layers in this study were obtained by using GaAs-GaInAs graded buffers. Additionally, the growth of high quality GaInP on Si was demonstrated. The minority carrier lifetime of 7 ns in these layers is the highest of any III-V/Si semiconductor measured in our laboratory.


1995 ◽  
Vol 378 ◽  
Author(s):  
J. Vanhellemont ◽  
A. Kaniava ◽  
M. Libezny ◽  
E. Simoen ◽  
G. Kissinger ◽  
...  

AbstractThe recombination activity of oxygen precipitation related lattice defects in p- and n-type silicon is studied with photoluminescence (PL) and microwave absorption (MWA) techniques. A direct correlation is observed between the amount of precipitated oxygen and the extended defect density on one hand and the minority carrier lifetime and PL activity on the other hand. The PL analyses show as dominant features in the spectra the Dl and D2 lines. The relative amplitude of the D-lines in the different samples is investigated as a function of the oxygen content, defect density and excitation level. The results are correlated with those of complementary techniques and are interrelated on the basis of Shockley-Read-Hall (SRH) theory.


1971 ◽  
Vol 7 (25) ◽  
pp. 754
Author(s):  
R.E. Thomas ◽  
V. Makios ◽  
S. Ogletree ◽  
R. Mckillican

2019 ◽  
Vol 3 (6) ◽  
Author(s):  
Zhihao Xu ◽  
Denis A. Shohonov ◽  
Andrew B. Filonov ◽  
Kazuhiro Gotoh ◽  
Tianguo Deng ◽  
...  

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