Lasing in Rare-Earth-Doped Semiconductors: Hopes and Facts

MRS Bulletin ◽  
1999 ◽  
Vol 24 (9) ◽  
pp. 27-32 ◽  
Author(s):  
T. Gregorkiewicz ◽  
J.M. Langer

Semiconductors doped with rare-earth (RE) elements have attracted a lot of attention as alternative materials for producing electrically pumpe d semiconductor lasers whose emission wavelength is very weakly dependent on temperature. This prospect is especially attractive in the case of indirect-gap Silicon, whose photonic applications as the material for light emitters still remain more of a hope than a reality. In view of a desirable emission wavelength at 1.5 μm, a lot of research has concentrated on Si:Er (see Coffa et al. for a recent review). It is generally recognized that doping with Er ions presents one of the most promising approaches to Silicon photonics. However, despiteintensive investigations, stimulated emission has not been conclusively demonstrated for Si.Er or for any other RE-doped semiconductor. This is in striking contrast to optical amplifiers and lasers based on various erbium-doped glasses. In this article, which builds on recent articles in MRS Bulletin on Silicon photonics, we will address the issues relevant to efficient light generation by semiconductors doped with RE elements in general, and specifically by Si:Er-based structures.The intraimpurity electronic structure of RE ions is dominate d by electron-electron and spin-orbit interactions within the 4f shell. In the case of Er3+, they produce separated J-multiplets with 4I15/2 and 4I13/2 as the ground and the lowest-lying excited states, respectively. Due to the effective Screening of 4f electrons by the outer electron Shells, the host has a very limited influence and changes only slightly the relative positions of the levels. Depending on a particular site symmetry, the even terms of the crystal field split the free-ion J-multiplets into the Stark components typically by several meV for the ground State. The energy-level diagram of an Er3+ ion in a cubic crystal field is shown in Figure 1, where the energy transfer paths relevant for Si:Er are also schematically indicated. The odd terms of the crystal field potential admix the states of opposite parity to the 4f11 configuration of the Er3+ ion, thereby introducing a certain degree of electric-dipole strength into the otherwise forbidden intra-4f-shell transitions. This effect enhance s slightly the magnetic-dipole strength of the 4I15/2 ↔ 4I13/2 transition and is host- and site-dependent. There-fore, Er-related center s of different microstructure can be fairly easily identified.

2005 ◽  
Vol 866 ◽  
Author(s):  
David Carey

AbstractThe g values of rare earth ions obtained from either paramagnetic resonance or Zeeman measurements are often used to interpret the location and/or environment surrounding rare earth ions. In the case of centres with cubic symmetry the g value can be used to distinguish between substitutional and interstitial sites. For centres with less than cubic symmetry the average g value, taken as 1/3 trace of the g tensor, is often used as an indication of the lattice location and/or a measure of the strength of the local crystal field. This approach is widely used but is based on the assumption that the non-cubic terms in the total crystal field potential are small compared with the cubic crystal field. In this paper we have explored this assumption by calculating the principal g values in axial crystal fields for the Er3+ ion. We examine the limits over which the average g value approach is valid. Comparison is made with published results.


MRS Bulletin ◽  
1999 ◽  
Vol 24 (9) ◽  
pp. 33-38 ◽  
Author(s):  
A.J. Steckl ◽  
J.M. Zavada

As discussed in the accompanying articles in this issue of MRS Bulletin, the optical properties of rare-earth (RE) elements have led to many important photonic applications, including solid-state lasers, components for telecommunications (optical-fiber amplifiers, fiber lasers), optical storage devices, and displays. In most of these applications, the host materials for the RE elements are various forms of oxide and nonoxide glasses. The emission can occur at visible or infrared (IR) wavelengths, depending on the electronic transitions of the selected RE element and the excitation mechanism. Until recently, the study of semiconductors doped with RE elements such as Pr and Er has concentrated primarily on the lowest excited state as an optically active transition. The presence of transitions at IR wavelengths (1.3 and 1.54 μm) that are coincident with minima in the optical dispersion and the loss of silica-based glass fibers utilized in telecommunications, combined with the prospect of integration with semiconductor device technology, has sparked considerable interest.The status and prospects of obtaining stimulated emission in Si:Er are reviewed by Gregorkiewicz and Langer in this issue and by Coffa et al. in a previous MRS Bulletin issue. While great progress is being made in enhancing the emission intensity of Er-doped Si, it still experiences significant loss in luminescence efficiency at room temperature, as compared with low temperatures. This thermal quenching was shown by Favennec et al. to de crease with the bandgap energy of the semiconductor. Hence wide-bandgap semiconductors (WBGSs) are attractive candidates for investigation as hosts for RE doping.


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pp. C4-277-C4-280 ◽  
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B. HYDE ◽  
D. BARBIER ◽  
J. HUBNER ◽  
J.-M. JOUANNO ◽  
A. KEVORKIAN ◽  
...  

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Author(s):  
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A.K. Bhattacharjee ◽  
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F. Gonzalez-Jimenez ◽  
J.R. Iglesias-Sicardi ◽  
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Vol 249 ◽  
pp. 012017
Author(s):  
R Capelletti ◽  
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