scholarly journals The Significant Effect of Supporting Electrolytes on the Galvanic Deposition of Metallic Rhenium

Author(s):  
Huazhen Cao ◽  

Micromachines ◽  
2021 ◽  
Vol 12 (7) ◽  
pp. 776
Author(s):  
Kurt W. Kolasinski

Electroless etching of semiconductors has been elevated to an advanced micromachining process by the addition of a structured metal catalyst. Patterning of the catalyst by lithographic techniques facilitated the patterning of crystalline and polycrystalline wafer substrates. Galvanic deposition of metals on semiconductors has a natural tendency to produce nanoparticles rather than flat uniform films. This characteristic makes possible the etching of wafers and particles with arbitrary shape and size. While it has been widely recognized that spontaneous deposition of metal nanoparticles can be used in connection with etching to porosify wafers, it is also possible to produced nanostructured powders. Metal-assisted catalytic etching (MACE) can be controlled to produce (1) etch track pores with shapes and sizes closely related to the shape and size of the metal nanoparticle, (2) hierarchically porosified substrates exhibiting combinations of large etch track pores and mesopores, and (3) nanowires with either solid or mesoporous cores. This review discussed the mechanisms of porosification, processing advances, and the properties of the etch product with special emphasis on the etching of silicon powders.



2019 ◽  
Vol 838 ◽  
pp. 23-32 ◽  
Author(s):  
Nadia Mansor ◽  
Norita Mohamed ◽  
Faizatul Shimal Mehamod ◽  
Faiz Bukhari Mohd Suah


2010 ◽  
Vol 2010 (27) ◽  
pp. 4309-4313 ◽  
Author(s):  
Qiaoling Xu ◽  
Guowen Meng ◽  
Bensong Chen ◽  
Xiangdong Li ◽  
Xiaoguang Zhu ◽  
...  


2011 ◽  
Vol 257 (13) ◽  
pp. 5519-5523 ◽  
Author(s):  
Lida Wang ◽  
Guichang Liu ◽  
Longjiang Zou ◽  
Dongfeng Xue


2016 ◽  
Vol 265 ◽  
pp. 2-6 ◽  
Author(s):  
Yuji Mahara ◽  
Hiroyuki Ishikawa ◽  
Junya Ohyama ◽  
Kyoichi Sawabe ◽  
Atsushi Satsuma


2020 ◽  
Vol 124 (35) ◽  
pp. 18930-18945
Author(s):  
Shivkanya Shinde ◽  
Pavel Majumdar ◽  
Sayantan Sil ◽  
Markus Löffler ◽  
Anamika Banerjee ◽  
...  
Keyword(s):  


2019 ◽  
Vol 119 ◽  
pp. 39-41 ◽  
Author(s):  
Chunzheng Wang ◽  
Weisong Xu ◽  
Zhengxing Qin ◽  
Svetlana Mintova


Author(s):  
А.В. Малевская ◽  
Н.Д. Ильинская ◽  
Д.А. Малевский ◽  
П.В. Покровский

Investigations and modeling of ohmic contacts electrochemical deposition process in postgrowth technology of photovoltaic converters fabrication have been carried out. The technology of Ag/Au contact system galvanic deposition at vertical and horizontal position of heterostructure and anode in the electrolyte has been developed. The increase of contact system deposition uniformity up to ∼ 95% at the thickness of contact bus-bars ∼ 5 µm on the heterostructure area with 4 inch diameter has been archived.



1990 ◽  
Vol 94 (22) ◽  
pp. 8451-8456 ◽  
Author(s):  
P. S. Kirlin ◽  
H. Knoezinger ◽  
Bruce C. Gates
Keyword(s):  


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