galvanic deposition
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Author(s):  
А.В. Малевская ◽  
Н.Д. Ильинская ◽  
Д.А. Малевский ◽  
П.В. Покровский

Investigations and modeling of ohmic contacts electrochemical deposition process in postgrowth technology of photovoltaic converters fabrication have been carried out. The technology of Ag/Au contact system galvanic deposition at vertical and horizontal position of heterostructure and anode in the electrolyte has been developed. The increase of contact system deposition uniformity up to ∼ 95% at the thickness of contact bus-bars ∼ 5 µm on the heterostructure area with 4 inch diameter has been archived.


ChemSusChem ◽  
2021 ◽  
Author(s):  
Aikaterini Touni ◽  
Xin Liu ◽  
Xiaolan Kang ◽  
Patricia A. Carvalho ◽  
Spyros Diplas ◽  
...  

ChemSusChem ◽  
2021 ◽  
Author(s):  
Aikaterini Touni ◽  
Xin Liu ◽  
Xiaolan Kang ◽  
Patricia Carvalho ◽  
Spyros Diplas ◽  
...  

Micromachines ◽  
2021 ◽  
Vol 12 (7) ◽  
pp. 776
Author(s):  
Kurt W. Kolasinski

Electroless etching of semiconductors has been elevated to an advanced micromachining process by the addition of a structured metal catalyst. Patterning of the catalyst by lithographic techniques facilitated the patterning of crystalline and polycrystalline wafer substrates. Galvanic deposition of metals on semiconductors has a natural tendency to produce nanoparticles rather than flat uniform films. This characteristic makes possible the etching of wafers and particles with arbitrary shape and size. While it has been widely recognized that spontaneous deposition of metal nanoparticles can be used in connection with etching to porosify wafers, it is also possible to produced nanostructured powders. Metal-assisted catalytic etching (MACE) can be controlled to produce (1) etch track pores with shapes and sizes closely related to the shape and size of the metal nanoparticle, (2) hierarchically porosified substrates exhibiting combinations of large etch track pores and mesopores, and (3) nanowires with either solid or mesoporous cores. This review discussed the mechanisms of porosification, processing advances, and the properties of the etch product with special emphasis on the etching of silicon powders.


Author(s):  
Kurt W. Kolasinski

Electroless etching of semiconductors was elevated to an advanced micromachining process by the addition of a structured metal catalyst. Patterning of the catalyst by lithographic techniques facilitates the patterning of crystalline and polycrystalline wafer substrates. Galvanic deposition of metals on semiconductors has a natural tendency to produce nanoparticles rather than flat uniform films. This characteristic makes possible the etching of not only wafers but also particles with arbitrary shape. While it has been widely recognized that spontaneous deposition of metal nanoparticles can be used in connection with etching to porosify wafers, it is also possible to produced nanostructured powders. MACE can be controlled to produce (1) etch track pores with shapes and sizes closely related to the shape and size of the metal nanoparticle, (2) hierarchically porosified substrates exhibiting combinations of large etch track pores and mesopores, and (3) nanowires with either solid or mesoporous cores. This review discussed the mechanisms of porosification, processing advances and the properties of the etch product with special emphasis on the etching of silicon powders.


2021 ◽  
Vol 2 ◽  
pp. 42-50
Author(s):  
A. A. Yakushkin ◽  
◽  
V. M. Borisov ◽  
V. N. Trofimov ◽  
◽  
...  

The issue presents the results of studies of methods for increasing the corrosion resistance of fuel claddings made from zirconium alloy E110, performed at the SRC RF TRINITI, using coatings (Al, Al2O3, Cr) by pulsed laser deposition, as well as magnetron sputtering and galvanic deposition of chromium. Also presented some results of studies of adhesion, microstructure and corrosion resistance of chromium coatings deposited by various methods. It was revealed that the corrosion resistance of the cladding of fuel rods with chrome coatings at temperatures of 1100 – 1200 °С practically does not depend on the method of their application. However, the coating method has a significant effect on their adhesion, with coatings obtained by atomic deposition methods and characterized by a continuous uniform structure have the greatest adhesion. The depth of oxidation of the outer surface of the cladding of a fuel rod when applying a chromium coating decreases by an average of 30 times for sponge-based alloy E110.


2020 ◽  
Vol 124 (35) ◽  
pp. 18930-18945
Author(s):  
Shivkanya Shinde ◽  
Pavel Majumdar ◽  
Sayantan Sil ◽  
Markus Löffler ◽  
Anamika Banerjee ◽  
...  
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