INVENT Surrogate Modeling and Optimization of Transient Thermal Responses

Author(s):  
Cameron Miller ◽  
Adam Maser ◽  
Elena Garcia ◽  
Dimitri Mavris
AIChE Journal ◽  
2018 ◽  
Vol 65 (3) ◽  
pp. 915-923 ◽  
Author(s):  
Ehecatl Antonio Rio‐Chanona ◽  
Jonathan L. Wagner ◽  
Haider Ali ◽  
Fabio Fiorelli ◽  
Dongda Zhang ◽  
...  

Author(s):  
Julia T. Luck ◽  
C. W. Boggs ◽  
S. J. Pennycook

The use of cross-sectional Transmission Electron Microscopy (TEM) has become invaluable for the characterization of the near-surface regions of semiconductors following ion-implantation and/or transient thermal processing. A fast and reliable technique is required which produces a large thin region while preserving the original sample surface. New analytical techniques, particularly the direct imaging of dopant distributions, also require good thickness uniformity. Two methods of ion milling are commonly used, and are compared below. The older method involves milling with a single gun from each side in turn, whereas a newer method uses two guns to mill from both sides simultaneously.


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