Mechanism of the process of photochemical metallization of dielectric surfaces

2019 ◽  
Vol 95 (3) ◽  
pp. 45-51
Author(s):  
P.A. Abdurazova ◽  
◽  
Sh.T. Koshkarbayeva ◽  
M.S. Satayev ◽  
N.O. Dzhakipbekova ◽  
...  
Keyword(s):  
Dielectric Surfaces

Interactions of Ge Atoms with High- ê Oxide Dielectric Surfaces

2005 ◽  
Vol 879 ◽  
Author(s):  
Scott K. Stanley ◽  
John G. Ekerdt
Keyword(s):  
Oxide Layer ◽  
Photoelectron Spectroscopy ◽  
Chemical Vapor ◽  
Temperature Programmed Desorption ◽  
Tungsten Filament ◽  
X Ray ◽  
Dielectric Surfaces ◽  
Temperature Programmed ◽  
The Stability ◽  
Ge Nanocrystals

AbstractGe is deposited on HfO2 surfaces by chemical vapor deposition (CVD) with GeH4. 0.7-1.0 ML GeHx (x = 0-3) is deposited by thermally cracking GeH4 on a hot tungsten filament. Ge oxidation and bonding are studied at 300-1000 K with X-ray photoelectron spectroscopy (XPS). Ge, GeH, GeO, and GeO2 desorption are measured with temperature programmed desorption (TPD) at 400-1000 K. Ge initially reacts with the dielectric forming an oxide layer followed by Ge deposition and formation of nanocrystals in CVD at 870 K. 0.7-1.0 ML GeHx deposited by cracking rapidly forms a contacting oxide layer on HfO2 that is stable from 300-800 K. Ge is fully removed from the HfO2 surface after annealing to 1000 K. These results help explain the stability of Ge nanocrystals in contact with HfO2.

Stochastic Plasma Charging of Nanopatterned Dielectric Surfaces

2008 ◽  
Vol 36 (4) ◽  
pp. 878-879
Author(s):  
J.A. Kenney ◽  
Eunsu Paek ◽  
G.S. Hwang
Keyword(s):  
Dielectric Surfaces

Sensitivity Enhancement of Electrolyte–Insulator–Semiconductor Sensors Using Mesotextured and Nanotextured Dielectric Surfaces

2015 ◽  
Vol 15 (4) ◽  
pp. 2039-2045 ◽  
Author(s):  
Subham Dastidar ◽  
Abhishek Agarwal ◽  
Narendra Kumar ◽  
Vivekananda Bal ◽  
Siddhartha Panda
Keyword(s):  
Sensitivity Enhancement ◽  
Dielectric Surfaces ◽  
Semiconductor Sensors

scholarly journals Tilt metrology on rough dielectric surfaces using low coherence scanning interferometry

2019 ◽  
Vol 27 (24) ◽  
pp. 35981 ◽  
Author(s):  
Chang-Yun Lee ◽  
Joonho You ◽  
Yunseok Kim
Keyword(s):  
Low Coherence ◽  
Dielectric Surfaces
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