Relationship between blurring factors and interfacial effects in chemically amplified resist processes in photomask fabrication
1991 ◽
Vol 9
(6)
◽
pp. 3380
◽
Keyword(s):
2000 ◽
Vol 147
(10)
◽
pp. 3833
◽
2002 ◽
Vol 20
(1)
◽
pp. 164