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Theoretical Study ◽  
Low Energy ◽  
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Interfacial Effects ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
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Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation

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Vol 41 (Part 1, No. 6B) ◽  
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Atsushi Ando ◽  
Ryoichi Inanami ◽  
Noriaki Sasaki ◽  
Kazuyoshi Sugihara ◽  
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Computer Simulation ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Chemically Amplified Resist ◽  
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Vol 42 (2) ◽  
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Michael A. Morrison ◽  
Lee A. Collins ◽  
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Vol 277 (1-3) ◽  
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J. Kopyra ◽  
I. Szamrej ◽  
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L.M. Graham ◽  
T.A. Field ◽  
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Electron Attachment ◽  
Low Energy ◽  
Energy Electron ◽  
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Vol 71 (1) ◽  
Author(s):  
Xiaotian Huang ◽  
Kedong Wang ◽  
Ju Meng ◽  
Shuangcheng Guo ◽  
Guoliang Xu
Keyword(s):  
Electron Scattering ◽  
Theoretical Study ◽  
Low Energy ◽  
Energy Electron ◽  
Low Energy Electron
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