Mechanism of thirdharmonic laserinduced damage on fused silica surface with processingintroduced metal absorbers

High-purity fused silica irradiated by third harmonic of the Nd:YAG laser in vacuum with different laser pulse parameters was studied experimentally. Laser-induced defects are investigated by UV spectroscopy, and fluorescence spectra and correlated to the structural modifications in the glass matrix through Raman spectroscopy. Results show that, for laser fluence below laser-induced damage threshold (LIDT), the absorbance and intensity of fluorescence bands increase with laser energies and/or number of laser pulses, which indicates that laser-induced defects are enhanced by laser energies and/or number of laser pulses in vacuum. The optical properties of these point defects were discussed in detail.

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Laser-induced damage characteristics in fused silica surface due to mechanical and chemical defects during manufacturing processes

Optics & Laser Technology ◽

10.1016/j.optlastec.2016.12.022 ◽

2017 ◽

Vol 91 ◽

pp. 149-158 ◽

Cited By ~ 14

Author(s):

Yaguo Li ◽

Zhigang Yuan ◽

Jian Wang ◽

Qiao Xu

Keyword(s):

Silica Surface ◽

Fused Silica ◽

Manufacturing Processes ◽

Damage Characteristics ◽

Laser Induced Damage

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Resistance of Scratched Fused Silica Surface to UV Laser Induced Damage

Scientific Reports ◽

10.1038/s41598-019-46048-4 ◽

2019 ◽

Vol 9 (1) ◽

Cited By ~ 4

Author(s):

Hui Ye ◽

Yaguo Li ◽

Qiao Xu ◽

Chen Jiang ◽

Zhonghou Wang

Keyword(s):

Silica Surface ◽

Fused Silica ◽

Uv Laser ◽

Laser Induced Damage

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Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica

Materials ◽

10.3390/ma13061294 ◽

2020 ◽

Vol 13 (6) ◽

pp. 1294

Author(s):

Yaoyu Zhong ◽

Yifan Dai ◽

Feng Shi ◽

Ci Song ◽

Ye Tian ◽

...

Keyword(s):

Silica Surface ◽

Ion Beam ◽

Damage Threshold ◽

Fused Silica ◽

Structural Defects ◽

Laser Damage ◽

Material Structure ◽

Ion Beam Etching ◽

Damage Resistance ◽

Laser Induced Damage

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics.

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