A New Optical Technique for Surface Roughness Measurement of Tio2 Thin Films

2011 ◽  
Vol 110-116 ◽  
pp. 831-838
Author(s):  
Chil Chyuan Kuo ◽  
Yi Ruei Chen

A rapid optical inspection system for rapid measuring the surface roughness of titanium dioxide (TiO2) thin films is developed in this work. The incident angle of 60° is a good candidate for measuring surface roughness of TiO2 thin films and y = 90.391x + 0.5123 is a trend equation for predicting the surface roughness of TiO2 thin films. Roughness average (Ra) of TiO2 thin films (y) can be directly deduced from the peak power density (x) using the optical inspection system developed. The results were verified by white-light interferometer. The best measurement error rate of the optical inspection system developed can be controlled about 8.8%.The saving in inspection time of the surface roughness of TiO2 thin films is up to 83%.

Optik ◽  
2013 ◽  
Vol 124 (14) ◽  
pp. 1902-1906 ◽  
Author(s):  
Chil-Chyuan Kuo ◽  
Yi-Ruei Chen ◽  
Cheng-Yi Tong ◽  
Jyh-Wei Lee

1996 ◽  
pp. 439-474
Author(s):  
A. R. Rao ◽  
N. Ramesh ◽  
F. Y. Wu ◽  
J. R. Mandeville ◽  
P. Kerstens

2005 ◽  
Vol 20 (11) ◽  
pp. 3141-3149 ◽  
Author(s):  
Li-Lan Yang ◽  
Yi-Sheng Lai ◽  
J.S. Chen ◽  
P.H. Tsai ◽  
C.L. Chen ◽  
...  

Thin films of SiO2–TiO2 composite oxides with various SiO2:TiO2 compositions were prepared by the sol-gel method, using tetraethylorthosilicate (TEOS) and titanium tetraisopropoxide (TTIP) as precursors. The composition, crystal structure, and chemical bonding configuration of the as-deposited and annealed SiO2–TiO2 thin films were analyzed using Rutherford backscattering spectrometry (RBS), glancing incident angle x-ray diffraction (GIAXRD) and Fourier transform infrared spectroscopy (FTIR), respectively. Optical properties of the films were characterized by spectroscopic ellipsometry and ultraviolet-visible spectrophotometry. The Si/Ti ratios in the SiO2–TiO2 films agree with the TEOS/TTIP molar ratio in the sol-gel precursor. When the TEOS/(TEOS + TTIP) ratio is greater than 40%, the SiO2–TiO2 thin films remain amorphous (without formation of TiO2 crystalline phase) after annealing at temperatures as high as 700 °C. FTIR spectra indicate that the quantity of Si–O–Ti bonding can be maximized when the TEOS:TTIP in the precursor is 80%:20%. The refractive index of the SiO2–TiO2 films increases approximately linearly to the mixing ratio of TTIP/(TEOS + TTIP). However, SiO2-rich films possess higher ultraviolet-visible transmittance than the TiO2-rich films. The modification of microstructure and chemical bonding configuration in the SiO2–TiO2 films by the composition and its influence on the optical properties are discussed.


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