Silicon Films Deposited by Low-Pressure Chemical Vapour Deposition for Microsystems

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.93.453 ◽

2003 ◽

Vol 93 ◽

pp. 453-458 ◽

Author(s):

H. Mahfoz-Kotb ◽

A.C. Salaün ◽

T. Mohammed-Brahim ◽

F. Bendriaa ◽

F. Le Bihan ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Films ◽

Pressure Chemical

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The growth of polycrystalline silicon films by low pressure chemical vapour deposition at relatively low temperatures

Thin Solid Films ◽

10.1016/0040-6090(88)90431-2 ◽

1988 ◽

Vol 163 ◽

pp. 249-254 ◽

Author(s):

D. Meakin ◽

P. Migliorato ◽

J. Stoemenos ◽

N.A. Economou

Keyword(s):

Chemical Vapour Deposition ◽

Low Temperatures ◽

Polycrystalline Silicon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Films ◽

Pressure Chemical ◽

Polycrystalline Silicon Films

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Properties of nitrogen doped silicon films deposited by low pressure chemical vapour deposition from disilane and ammonia

Thin Solid Films ◽

10.1016/s0040-6090(02)00434-0 ◽

2002 ◽

Vol 414 (1) ◽

pp. 13-17 ◽

Author(s):

P Temple-Boyer ◽

L Jalabert ◽

E Couderc ◽

E Scheid ◽

P Fadel ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Films ◽

Nitrogen Doped ◽

Doped Silicon ◽

Pressure Chemical

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Influences of deposition and crystallization kinetics on the properties of silicon films deposited by low-pressure chemical vapour deposition from silane and disilane

Thin Solid Films ◽

10.1016/j.tsf.2010.07.037 ◽

2010 ◽

Vol 518 (23) ◽

pp. 6897-6903 ◽

Author(s):

Pierre Temple-Boyer ◽

B. Rousset ◽

E. Scheid

Keyword(s):

Crystallization Kinetics ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Films ◽

Pressure Chemical

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Photostable amorphous-silicon films by low-pressure chemical vapour deposition

10.1117/12.56990 ◽

1992 ◽

Author(s):

K. K. Sharma ◽

Claudio Manfredotti

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Films ◽

Pressure Chemical

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Material and electronic properties of boron-doped silicon films deposited from SiH4BCl3N2 mixtures in an industrial low pressure chemical vapour deposition furnace

Thin Solid Films ◽

10.1016/0040-6090(91)90492-g ◽

1991 ◽

Vol 204 (1) ◽

pp. 33-48 ◽

Author(s):

D. Bielle-Daspet ◽

E. Scheid ◽

C. Azzaro ◽

B. De Mauduit ◽

B. Pieraggi

Keyword(s):

Electronic Properties ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Films ◽

Boron Doped ◽

Doped Silicon ◽

Pressure Chemical

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Crystallization of amorphous thin low pressure chemical vapour deposition silicon films: in situ TEM measurement of grain growth rates

Journal of Materials Science Letters ◽

10.1007/bf00455615 ◽

1993 ◽

Vol 12 (12) ◽

pp. 910-912 ◽

Author(s):

J. P. Guillemet ◽

B. de Mauduit ◽

B. Pieraggi ◽

E. Campo ◽

E. Scheid

Keyword(s):

Grain Growth ◽

Chemical Vapour Deposition ◽

Growth Rates ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Films ◽

In Situ Tem ◽

Pressure Chemical

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Phosphorus-doped silicon films prepared by low pressure chemical vapour deposition of disilane and phosphine

Thin Solid Films ◽

10.1016/0040-6090(87)90162-3 ◽

1987 ◽

Vol 148 (2) ◽

pp. L63-L65 ◽

Author(s):

W. Ahmed ◽

D.B. Meakin

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Films ◽

Doped Silicon ◽

Pressure Chemical ◽

Phosphorus Doped

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Homogeneous nucleation during crystallization of amorphous silicon produced by low-pressure chemical vapour deposition

Philosophical Magazine A ◽

10.1080/01418610110067734 ◽

2002 ◽

Vol 82 (1) ◽

pp. 137-165 ◽

Author(s):

A. Q. He ◽

A. H. Heuer ◽

H. Kahn

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Homogeneous Nucleation ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Pressure Chemical

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Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:1999849 ◽

1999 ◽

Vol 09 (PR8) ◽

pp. Pr8-395-Pr8-402 ◽

Author(s):

B. Armas ◽

M. de Icaza Herrera ◽

C. Combescure ◽

F. Sibieude ◽

D. Thenegal

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Cold Wall ◽

Pressure Chemical ◽

Mullite Coatings

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Kinetics of the initial stages of film formation during low pressure chemical vapour deposition of polysilicon by pyrolysis of silane

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:2001324 ◽

2001 ◽

Vol 11 (PR3) ◽

pp. Pr3-189-Pr3-196

Author(s):

L. Zambov ◽

B. Caussat ◽

R. Boubeker ◽

J.-P. Couderc

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Film Formation ◽

Chemical Vapour ◽

Low Pressure ◽

Pressure Chemical ◽

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