minority carrier lifetimes
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2021 ◽  
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S. R. Bank

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Vol 124 ◽  
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2017 ◽  
Vol 897 ◽  
pp. 67-70 ◽  
Author(s):  
Tetsuya Miyazawa ◽  
Takeshi Tawara ◽  
Hidekazu Tsuchida

Epitaxial growth of 4H-SiC with intentional V or Ti doping was performed to obtain short minority carrier lifetimes, using VCl4 or TiCl4 as the doping sources. The doping efficiencies and quality of the epilayers were compared for H2+SiH4+C3H8 and H2+SiH4+C3H8+HCl gas systems. The addition of V or Ti in highly N-doped epilayer demonstrated very short minority carrier lifetimes of 20-30 ns at 250°C.


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