diamond chemical vapor deposition Recently Published Documents

Vapor Deposition ◽

Gas Flow ◽

Chemical Vapor ◽

Flow Environment ◽

Study of microwave discharge at high power density conditions in diamond chemical vapor deposition reactor by optical emission spectroscopy

Diamond and Related Materials ◽

10.1016/j.diamond.2019.04.030 ◽

2019 ◽

Vol 97 ◽

pp. 107407 ◽

Author(s):

S.A. Bogdanov ◽

A.M. Gorbachev ◽

A.L. Vikharev ◽

D.B. Radishev ◽

M.A. Lobaev

Keyword(s):

Vapor Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Microwave Discharge ◽

Chemical Vapor ◽

Optical Emission ◽

High Power Density ◽

Chemical Vapor Deposition Reactor ◽

Combined Spatially Resolved Optical Emission Imaging and Modeling Studies of Microwave-Activated H2/Ar and H2/Kr Plasmas Operating at Powers and Pressures Relevant for Diamond Chemical Vapor Deposition

The Journal of Physical Chemistry A ◽

10.1021/acs.jpca.8b12294 ◽

2019 ◽

Vol 123 (13) ◽

pp. 2544-2558 ◽

Author(s):

Edward J. D. Mahoney ◽

Sohail Mushtaq ◽

Michael N. R. Ashfold ◽

Yuri A. Mankelevich

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Optical Emission ◽

Spatially Resolved ◽

Modeling Studies ◽

Theory of Diamond Chemical Vapor Deposition

Handbook of Industrial Diamonds and Diamond Films ◽

10.1201/9780203752807-11 ◽

2018 ◽

pp. 527-581 ◽

Author(s):

David G. Goodwin ◽

James E. Butler

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Spatially Resolved Optical Emission and Modeling Studies of Microwave-Activated Hydrogen Plasmas Operating under Conditions Relevant for Diamond Chemical Vapor Deposition

The Journal of Physical Chemistry A ◽

10.1021/acs.jpca.8b07491 ◽

2018 ◽

Vol 122 (42) ◽

pp. 8286-8300 ◽

Cited By ~ 6

Author(s):

Edward J. D. Mahoney ◽

Benjamin S. Truscott ◽

Sohail Mushtaq ◽

Michael N. R. Ashfold ◽

Yuri A. Mankelevich

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Optical Emission ◽

Spatially Resolved ◽

Hydrogen Plasmas ◽

Modeling Studies ◽

Homoepitaxial diamond chemical vapor deposition for ultra-light doping

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2016.11.012 ◽

2017 ◽

Vol 70 ◽

pp. 197-202 ◽

Author(s):

T. Teraji ◽

J. Isoya ◽

K. Watanabe ◽

S. Koizumi ◽

Y. Koide

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Three-dimensional kinetic Monte Carlo simulations of diamond chemical vapor deposition

The Journal of Chemical Physics ◽

10.1063/1.4921540 ◽

2015 ◽

Vol 142 (21) ◽

pp. 214707 ◽

Cited By ~ 18

Author(s):

W. J. Rodgers ◽

P. W. May ◽

N. L. Allan ◽

J. N. Harvey

Keyword(s):

Monte Carlo ◽

Monte Carlo Simulations ◽

Vapor Deposition ◽

Kinetic Monte Carlo ◽

Three Dimensional ◽

Chemical Vapor ◽

Kinetic Monte Carlo Simulations ◽

Optical Emission from Microwave Activated C/H/O Gas Mixtures for Diamond Chemical Vapor Deposition

The Journal of Physical Chemistry A ◽

10.1021/jp306191y ◽

2012 ◽

Vol 116 (38) ◽

pp. 9447-9458 ◽

Cited By ~ 18

Author(s):

James C. Richley ◽

Mark W. Kelly ◽

Michael N. R. Ashfold ◽

Yuri A. Mankelevich

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Optical Emission ◽

Gas Mixtures ◽

ChemInform Abstract: Chlorine-Activated Diamond Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199506260 ◽

2010 ◽

Vol 26 (6) ◽

pp. no-no

Author(s):

C. PAN ◽

C. J. CHU ◽

J. L. MARGRAVE ◽

R. H. HAUGE

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

ChemInform Abstract: Unravelling Aspects of the Gas Phase Chemistry Involved in Diamond Chemical Vapor Deposition

ChemInform ◽

10.1002/chin.200146271 ◽

2010 ◽

Vol 32 (46) ◽

pp. no-no

Author(s):

Michael N. R. Ashfold ◽

Paul W. May ◽

James R. Petherbridge ◽

Keith N. Rosser ◽

James A. Smith ◽

...

Keyword(s):

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽