mtorr argon
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Author(s):  
S.K. Streiffer ◽  
C.B. Eom ◽  
J.C. Bravman ◽  
T.H. Geballet

The study of very thin (<15 nm) YBa2Cu3O7−δ (YBCO) films is necessary both for investigating the nucleation and growth of films of this material and for achieving a better understanding of multilayer structures incorporating such thin YBCO regions. We have used transmission electron microscopy to examine ultra-thin films grown on MgO substrates by single-target, off-axis magnetron sputtering; details of the deposition process have been reported elsewhere. Briefly, polished MgO substrates were attached to a block placed at 90° to the sputtering target and heated to 650 °C. The sputtering was performed in 10 mtorr oxygen and 40 mtorr argon with an rf power of 125 watts. After deposition, the chamber was vented to 500 torr oxygen and allowed to cool to room temperature. Because of YBCO’s susceptibility to environmental degradation and oxygen loss, the technique of Xi, et al. was followed and a protective overlayer of amorphous YBCO was deposited on the just-grown films.


1988 ◽  
Vol 130 ◽  
Author(s):  
T. W. Wu ◽  
R. A. Burn ◽  
M. M. Chen ◽  
P. S. Alexopoulos

AbstractMicro-indentation and micro-scratch techniques were used to characterize the hardness and the adhesion strength of 0.11 μm thick sputtered carbon f-ilms on Silicon substrates. Hardness depth profiles and critical loads were measured using a microindenter under indentation and scratch testing modes, respectively. The carbon film with 6 mtorr argon sputtering pressure shows better practical adhesion (or higher critical load) and slightly higher hardness. The indentation fracture phenomenon observed on the 30 mtorr film is closely related to its poor adhesion. The failure mechanism will also be discussed.


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