Abstract
Spectroscopic ellipsometry is a powerful tool for characterization of thin films / surfaces. To simultaneously extract optical constant and film thickness from ellipsometric parameters ψ and Δ, dispersion models of material’s refractive index and spectroscopic ellipsometry measurement have been often required. In this work, we propose an extraction method of optical parameters of thin films from the reflection and transmission ellipsometric parameters. This method necessitates neither spectroscopic information of ψ and Δ, nor dispersion models. Verification measurements were carried out with the single-point and imaging ellipsometers, respectively.
Spectroscopic Ellipsometry Measurement and Modeling of Hydrogenated Amorphous Silicon
