[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop
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A sequential experimentation strategy and response surface methodologies for process optimization

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167404 ◽

2002 ◽

Author(s):

G.E. Flores ◽

D.H. Norbury

Keyword(s):

Response Surface ◽

Process Optimization ◽

Sequential Experimentation

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Technology transfer utilizing the proof-of-concept facility

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167385 ◽

2002 ◽

Author(s):

R.D. Fair ◽

J.F. Freedman

Keyword(s):

Technology Transfer ◽

Proof Of Concept

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Control chart techniques for high volume, multiple process wafer fabrication areas

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167399 ◽

2002 ◽

Author(s):

T. Bassett

Keyword(s):

Control Chart ◽

High Volume ◽

Wafer Fabrication ◽

Multiple Process

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Work-in-process control in a continuous-flow manufacturing line

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167379 ◽

2002 ◽

Author(s):

C.S. Toof ◽

D.E. Weston

Keyword(s):

Process Control ◽

Continuous Flow ◽

Manufacturing Line ◽

Work In Process

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3-D solid modeling for assembly design

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167397 ◽

2002 ◽

Author(s):

J. DeRosa ◽

J. McGrath

Keyword(s):

Solid Modeling ◽

Assembly Design

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Membrane-type pin protector for pin grid array devices

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167396 ◽

2002 ◽

Author(s):

S.-P.T. Wang ◽

P. Ogden

Keyword(s):

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World class manufacturing CIM or sink

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167378 ◽

2002 ◽

Author(s):

D.J. Miller ◽

F.J. Anastasio

Keyword(s):

World Class ◽

World Class Manufacturing

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Modeling and control of an epitaxial silicon deposition process with step disturbances

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167393 ◽

2002 ◽

Author(s):

E. Sachs ◽

A. Hu ◽

A. Ingolfsson ◽

P.H. Langer

Keyword(s):

Deposition Process ◽

Epitaxial Silicon ◽

Silicon Deposition ◽

Modeling And Control ◽

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Statistically based feedback control of photoresist application

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167407 ◽

2002 ◽

Author(s):

S. Leang ◽

C.J. Spanos

Keyword(s):

Feedback Control

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A modified Kanban system in a semiconductor manufacturing environment

[1991 Proceedings] IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop ◽

10.1109/asmc.1991.167380 ◽

2002 ◽

Author(s):

S. Otenti

Keyword(s):

Semiconductor Manufacturing ◽

Manufacturing Environment ◽

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