Ion Implantation in Semiconductors
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Published By Springer US

9781468421538, 9781468421514
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Control of Secondary Defects by Tin Diffusion in Ion Implanted Silicon Crystals

1975 ◽  
pp. 577-584
Author(s):  
G. Nakamura ◽  
Y. Yukimoto ◽  
Y. Hirose
Keyword(s):  
Silicon Crystals ◽  
Ion Implanted

Recovery of Silicon Layers Damaged by Low Energy Ion Bombardment

1975 ◽  
pp. 547-552 ◽  
Author(s):  
R. Prisslinger ◽  
S. Kalbitzer ◽  
H. Kräutle ◽  
J. J. Grob ◽  
P. Siffert
Keyword(s):  
Ion Bombardment ◽  
Low Energy

Backscattering and ESR Studies in Heavily Damaged Layer

1975 ◽  
pp. 473-483 ◽  
Author(s):  
Kohzoh Masuda

Implantation of Silicon Into Gallium Arsenide

1975 ◽  
pp. 41-46 ◽  
Author(s):  
T. Miyazaki ◽  
M. Tamura
Keyword(s):  
Gallium Arsenide

Ionized-Cluster Beam Deposition

1975 ◽  
pp. 341-346 ◽  
Author(s):  
T. Takagi ◽  
I. Yamada ◽  
K. Yanagawa
Keyword(s):  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Nitrogen Implantation in SiC: Lattice Disorder and Foreign-Atom Location Studies

1975 ◽  
pp. 291-298 ◽  
Author(s):  
A. B. Campbell ◽  
J. Shewchun ◽  
D. A. Thompson ◽  
J. A. Davies ◽  
J. B. Mitchell
Keyword(s):  
Nitrogen Implantation ◽  
Foreign Atom ◽  
Lattice Disorder

Ion-Bombardment-Induced Surface Expansion of Solids

1975 ◽  
pp. 285-290 ◽  
Author(s):  
H. Tanoue ◽  
T. Tsurushima
Keyword(s):  
Ion Bombardment ◽  
Surface Expansion

Implantation of Boron and Lithium in Semiconductors and Metals

1975 ◽  
pp. 211-218 ◽  
Author(s):  
J. P. Biersack ◽  
D. Fink
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