12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004.
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Emissivity compensated pyrometry for specular silicon surfaces on the NIST RTP test bed

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441958 ◽

2005 ◽

Author(s):

B.K. Tsai ◽

J. Bodycomb ◽

D.P. DeWitt ◽

K.G. Kreider ◽

W.A. Kimes

Keyword(s):

Silicon Surfaces ◽

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Post BF/sub 2//sup +/ implant annealing using single wafer rapid thermal furnace

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441949 ◽

2005 ◽

Author(s):

T. Fukada ◽

Woo Sik Yoo

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Advanced doping and millisecond annealing for ultra-shallow junctions for 65 nm and beyond

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441943 ◽

2005 ◽

Author(s):

S.P. McCoy ◽

E.A. Arevalo ◽

J.C. Gelpey ◽

D.F. Downey

Keyword(s):

Shallow Junctions ◽

Ultra Shallow Junctions

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In situ calibration of lightpipe radiometers for rapid thermal processing between 300°C to 700°C

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441956 ◽

2005 ◽

Author(s):

W.A. Kimes ◽

K.G. Kreider ◽

D.C. Ripple ◽

B.K. Tsai

Keyword(s):

Thermal Processing ◽

Rapid Thermal Processing ◽

In Situ Calibration

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Optimal design of pulse forming networks and flashlamps for thermal flash processes

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441940 ◽

2005 ◽

Author(s):

M. Barak

Keyword(s):

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Status of NIST near infrared emittance measurement system

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441957 ◽

2005 ◽

Author(s):

L.M. Hanssen ◽

M. Rink ◽

S.N. Mekhontsev

Keyword(s):

Measurement System ◽

Near Infrared ◽

Emittance Measurement

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Wet rapid thermal oxidation of vertical cavity surface emitting laser structures with pyrogenic steam generator

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441950 ◽

2005 ◽

Author(s):

T. Gutt ◽

Hin Yiu Anthony Chung ◽

G.J. Feldmeyer

Keyword(s):

Thermal Oxidation ◽

Steam Generator ◽

Cavity Surface ◽

Rapid Thermal Oxidation ◽

Vertical Cavity Surface ◽

Surface Emitting Laser ◽

Vertical Cavity

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Dynamic surface anneal: activation without diffusion

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441892 ◽

2005 ◽

Author(s):

D. Jennings ◽

A. Mayur ◽

V. Parihar ◽

Haifan Liang ◽

R. Mcintosh ◽

...

Keyword(s):

Dynamic Surface

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Modeling and experimental results for an RTP light-pipe radiation thermometer calibration testbed

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441961 ◽

2005 ◽

Author(s):

K.S. Ball ◽

J.R. Howell

Keyword(s):

Radiation Thermometer ◽

Experimental Results ◽

Thermometer Calibration

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Leveraging a low pressure thermal module to meet the challenges of advanced device manufacturing

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441938 ◽

2005 ◽

Author(s):

B. Peuse ◽

M. Pfarr ◽

P. Timans ◽

Yaozhi Hu

Keyword(s):

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