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Photomask Technology 2019
Latest Publications
TOTAL DOCUMENTS
46
(FIVE YEARS 46)
H-INDEX
1
(FIVE YEARS 1)
Published By SPIE
9781510629998, 9781510630000
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
Actinic patterned mask defect inspection for EUV lithography
Photomask Technology 2019
◽
10.1117/12.2538001
◽
2019
◽
Author(s):
Hiroki Miyai
◽
Tsunehito Kohyama
◽
Tomohiro Suzuki
◽
Kiwamu Takehisa
◽
Haruhiko Kusunose
Keyword(s):
Defect Inspection
◽
Euv Lithography
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Front Matter: Volume 11148
Photomask Technology 2019
◽
10.1117/12.2555538
◽
2019
◽
Keyword(s):
Matter Volume
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Five deep learning recipes for the mask-making industry
Photomask Technology 2019
◽
10.1117/12.2538440
◽
2019
◽
Author(s):
Ajay K. Baranwal
◽
Mike Meyer
◽
Thang Nguyen
◽
Suhas Pillai
◽
Noriaki Nakayamada
◽
...
Keyword(s):
Deep Learning
◽
Mask Making
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Making digital twins using the Deep Learning Kit (DLK)
Photomask Technology 2019
◽
10.1117/12.2538508
◽
2019
◽
Author(s):
Linyong Pang
◽
Suhas Pillai
◽
Thang Nguyen
◽
Mike Meyer
◽
Ajay Baranwal
◽
...
Keyword(s):
Deep Learning
◽
Digital Twins
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Photoresist development as a reaction-diffusion process (Conference Presentation)
Photomask Technology 2019
◽
10.1117/12.2538165
◽
2019
◽
Author(s):
Gurdaman Khaira
◽
Yuri Granik
Keyword(s):
Diffusion Process
◽
Reaction Diffusion
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Design to silicon flow challenges for silicon photonics (Conference Presentation)
Photomask Technology 2019
◽
10.1117/12.2539054
◽
2019
◽
Author(s):
Ian Stobert
◽
Karen Badger
◽
Gek Soon Chua
◽
Mohamed Gheith
◽
Matthew Kinzler
◽
...
Keyword(s):
Silicon Photonics
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CNT EUV pellicle: balancing options (Conference Presentation)
Photomask Technology 2019
◽
10.1117/12.2539262
◽
2019
◽
Author(s):
Emily E. Gallagher
◽
Ivan Pollentier
◽
Marina Y. Timmermans
◽
Marina Mariano Juste
◽
Cedric Huyghebaert
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Creating nonideality: enabling cross-platform process matching solutions with MPC (and a lot of hard work)
Photomask Technology 2019
◽
10.1117/12.2538347
◽
2019
◽
Author(s):
Charles Whiting
◽
Ingo Bork
◽
Peter Buck
◽
Robin Chia
◽
Bhardwaj S. Durvasula
◽
...
Keyword(s):
Hard Work
◽
Platform Process
◽
Cross Platform
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Examination of flatness key performance indicators for reticles in next-generation, high-NA EUV scanners
Photomask Technology 2019
◽
10.1117/12.2539247
◽
2019
◽
Author(s):
David L. Aronstein
◽
Christopher Avery
◽
Katherine Ballman
◽
Chris Lee
◽
John Zimmerman
Keyword(s):
Performance Indicators
◽
Key Performance Indicators
◽
Next Generation
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EUV reticle defectivity protection options
Photomask Technology 2019
◽
10.1117/12.2535396
◽
2019
◽
Author(s):
Michael J. Lercel
◽
Christophe Smeets
◽
Mark A. van de Kerkhof
◽
Amo Chen
◽
Tjarko van Empel
◽
...
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