Photomask Technology 2019
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46
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Published By SPIE

9781510629998, 9781510630000
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

scholarly journals Actinic patterned mask defect inspection for EUV lithography

2019 ◽  
Author(s):  
Hiroki Miyai ◽  
Tsunehito Kohyama ◽  
Tomohiro Suzuki ◽  
Kiwamu Takehisa ◽  
Haruhiko Kusunose
Keyword(s):  
Defect Inspection ◽  
Euv Lithography

scholarly journals Front Matter: Volume 11148

2019 ◽  
Keyword(s):  
Matter Volume

Five deep learning recipes for the mask-making industry

2019 ◽  
Author(s):  
Ajay K. Baranwal ◽  
Mike Meyer ◽  
Thang Nguyen ◽  
Suhas Pillai ◽  
Noriaki Nakayamada ◽  
...  
Keyword(s):  
Deep Learning ◽  
Mask Making

Making digital twins using the Deep Learning Kit (DLK)

2019 ◽  
Author(s):  
Linyong Pang ◽  
Suhas Pillai ◽  
Thang Nguyen ◽  
Mike Meyer ◽  
Ajay Baranwal ◽  
...  
Keyword(s):  
Deep Learning ◽  
Digital Twins

Photoresist development as a reaction-diffusion process (Conference Presentation)

2019 ◽  
Author(s):  
Gurdaman Khaira ◽  
Yuri Granik
Keyword(s):  
Diffusion Process ◽  
Reaction Diffusion

Design to silicon flow challenges for silicon photonics (Conference Presentation)

2019 ◽  
Author(s):  
Ian Stobert ◽  
Karen Badger ◽  
Gek Soon Chua ◽  
Mohamed Gheith ◽  
Matthew Kinzler ◽  
...  
Keyword(s):  
Silicon Photonics

CNT EUV pellicle: balancing options (Conference Presentation)

2019 ◽  
Author(s):  
Emily E. Gallagher ◽  
Ivan Pollentier ◽  
Marina Y. Timmermans ◽  
Marina Mariano Juste ◽  
Cedric Huyghebaert

Creating nonideality: enabling cross-platform process matching solutions with MPC (and a lot of hard work)

2019 ◽  
Author(s):  
Charles Whiting ◽  
Ingo Bork ◽  
Peter Buck ◽  
Robin Chia ◽  
Bhardwaj S. Durvasula ◽  
...  
Keyword(s):  
Hard Work ◽  
Platform Process ◽  
Cross Platform

Examination of flatness key performance indicators for reticles in next-generation, high-NA EUV scanners

2019 ◽  
Author(s):  
David L. Aronstein ◽  
Christopher Avery ◽  
Katherine Ballman ◽  
Chris Lee ◽  
John Zimmerman
Keyword(s):  
Performance Indicators ◽  
Key Performance Indicators ◽  
Next Generation

EUV reticle defectivity protection options

2019 ◽  
Author(s):  
Michael J. Lercel ◽  
Christophe Smeets ◽  
Mark A. van de Kerkhof ◽  
Amo Chen ◽  
Tjarko van Empel ◽  
...  
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