Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
Latest Publications

TOTAL DOCUMENTS

27
(FIVE YEARS 0)

H-INDEX

2
(FIVE YEARS 0)

Published By SPIE

9781510630734, 9781510630741
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Template development for sub15nm nanoimprint lithography

2020 ◽  
Author(s):  
Ryota Seki ◽  
Akihiko Ando ◽  
Takeharu Motokawa ◽  
Machiko Suenaga ◽  
Noriko Iida nee Sakurai ◽  
...  
Keyword(s):  
Nanoimprint Lithography

Design and investigation of a maskless lithography system for printing patterns on the inside surface of a long pipe

2019 ◽  
Author(s):  
Toshiyuki Horiuchi ◽  
Kousuke Akitani ◽  
Kazumi Imahashi ◽  
Yuta Suzuki ◽  
Jun-ya Iwasaki ◽  
...  
Keyword(s):  
Inside Surface ◽  
Maskless Lithography ◽  
Lithography System

The study of relationship between defect sensitivity and inspectability on EUV masks with 19x nm mask inspection

2019 ◽  
Author(s):  
Masashi Yonetani ◽  
Karen D. Badger ◽  
Jed Rankin ◽  
Shinji Akima ◽  
Yusuke Toda ◽  
...  
Keyword(s):  
Defect Sensitivity ◽  
Mask Inspection

scholarly journals Lifetime test on EUV photomask with EBL2

2019 ◽  
Author(s):  
Chien-Ching Wu ◽  
Markus Bender ◽  
Rik Jonckheere ◽  
Frank Scholze ◽  
Herman Bekman ◽  
...  
Keyword(s):  
Lifetime Test

EUV pellicle qualification on transmission and reflectance

2019 ◽  
Author(s):  
T. Missalla ◽  
A. Biermanns-Föth ◽  
C. Pampfer ◽  
J. Arps ◽  
C. Phiesel ◽  
...  

The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay

2019 ◽  
Author(s):  
Richard J. van Haren ◽  
Steffen Steinert ◽  
Orion Mouraille ◽  
Koen D’havé ◽  
Leon van Dijk ◽  
...  
Keyword(s):  
Alignment Mark ◽  
Placement Accuracy ◽  
The Impact
Load More ...
Sign in / Sign up

Export Citation Format

Share Document