Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
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9781510630734, 9781510630741
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Template development for sub15nm nanoimprint lithography

2020 ◽  
Author(s):  
Ryota Seki ◽  
Akihiko Ando ◽  
Takeharu Motokawa ◽  
Machiko Suenaga ◽  
Noriko Iida nee Sakurai ◽  
...  
Keyword(s):  
Nanoimprint Lithography

scholarly journals Lifetime test on EUV photomask with EBL2

2019 ◽  
Author(s):  
Chien-Ching Wu ◽  
Markus Bender ◽  
Rik Jonckheere ◽  
Frank Scholze ◽  
Herman Bekman ◽  
...  
Keyword(s):  
Lifetime Test

EUV pellicle qualification on transmission and reflectance

2019 ◽  
Author(s):  
T. Missalla ◽  
A. Biermanns-Föth ◽  
C. Pampfer ◽  
J. Arps ◽  
C. Phiesel ◽  
...  
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