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Metrology, Inspection, and Process Control for Microlithography XXXI
Latest Publications
TOTAL DOCUMENTS
7
(FIVE YEARS 0)
H-INDEX
1
(FIVE YEARS 0)
Published By SPIE
9781510607415, 9781510607422
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Latest Documents
Most Cited Documents
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SEM review color imaging detection of gate to source/drain short in 14nm finFET device (Conference Presentation)
Metrology, Inspection, and Process Control for Microlithography XXXI
◽
10.1117/12.2253723
◽
2017
◽
Author(s):
Kwame Owusu-Boahen
◽
JaeHun Park
◽
HyeJung Lee
Keyword(s):
Color Imaging
◽
Imaging Detection
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"Non-destructive" dimensional metrology of EUV resist gratings (Conference Presentation)
Metrology, Inspection, and Process Control for Microlithography XXXI
◽
10.1117/12.2257690
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2017
◽
Author(s):
R. Joseph Kline
◽
Daniel F. Sunday
◽
Donald Windover
◽
Tero S. Kulmala
◽
Yasin Ekinci
Keyword(s):
Dimensional Metrology
◽
Non Destructive
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The coming of age of the first hybrid metrology software platform dedicated to nanotechnologies (Conference Presentation)
Metrology, Inspection, and Process Control for Microlithography XXXI
◽
10.1117/12.2258093
◽
2017
◽
Author(s):
Johann Foucher
◽
Aurelien Labrosse
◽
Alexandre Dervillé
◽
Yann Zimmermann
◽
Guilhem Bernard
◽
...
Keyword(s):
Coming Of Age
◽
Software Platform
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Surface topography analysis and performance on post-CMP images (Conference Presentation)
Metrology, Inspection, and Process Control for Microlithography XXXI
◽
10.1117/12.2258357
◽
2017
◽
Author(s):
Jusang Lee
◽
Abner F. Bello
◽
Shinichiro Kakita
◽
Nicholas Pieniazek
◽
Timothy A. Johnson
Keyword(s):
Surface Topography
◽
Topography Analysis
◽
And Performance
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3D SEM characterization of advanced sidewall patterning process (Conference Presentation)
Metrology, Inspection, and Process Control for Microlithography XXXI
◽
10.1117/12.2258101
◽
2017
◽
Author(s):
Shimon Levi
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CD-SEM metrology and OPC modeling for 2D patterning in advanced technology nodes (Conference Presentation)
Metrology, Inspection, and Process Control for Microlithography XXXI
◽
10.1117/12.2260443
◽
2017
◽
Cited By ~ 1
Author(s):
Thomas I. Wallow
◽
Chen Zhang
◽
Anita Fumar-Pici
◽
Jun Chen
◽
Bart Laenens
◽
...
Keyword(s):
Advanced Technology
◽
Technology Nodes
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Electrical test prediction using hybrid metrology and machine learning
Metrology, Inspection, and Process Control for Microlithography XXXI
◽
10.1117/12.2261091
◽
2017
◽
Cited By ~ 2
Author(s):
John Gaudiello
◽
Susan Emans
◽
Michael Shifrin
◽
Yoav Etzioni
◽
Ronen Urenski
◽
...
Keyword(s):
Machine Learning
◽
Electrical Test
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