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Photomask Technology
Latest Publications
TOTAL DOCUMENTS
53
(FIVE YEARS 0)
H-INDEX
2
(FIVE YEARS 0)
Published By SPIE
9781510613768, 9781510613775
Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
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Latest Documents
Most Cited Documents
Contributed Authors
Related Sources
Related Keywords
1X HP EUV reticle inspection with a 193nm inspection system
Photomask Technology
◽
10.1117/12.2281354
◽
2018
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Author(s):
William H. Broadbent
◽
Sterling Watson
◽
Pei-Chun Chiang
◽
Rui-Fang Shi
◽
Jim-Ren Wang
◽
...
Keyword(s):
Inspection System
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Front Matter: Volume 10451
Photomask Technology
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10.1117/12.2293163
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2017
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Author(s):
Proceedings of SPIE
Keyword(s):
Matter Volume
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Dimensional measurement sensitivity analysis for a MoSi photomask using DUV reflection scatterfield imaging microscopy
Photomask Technology
◽
10.1117/12.2280782
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2017
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Author(s):
Martin Y. Sohn
◽
Dong-Ryoung Lee
◽
Bryan M. Barnes
◽
Richard M. Silver
◽
Ronald Dixson
◽
...
Keyword(s):
Sensitivity Analysis
◽
Measurement Sensitivity
◽
Dimensional Measurement
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Full-chip GPU-accelerated curvilinear EUV dose and shape correction
Photomask Technology
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10.1117/12.2281686
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2017
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Author(s):
Aki Fujimura
◽
Oleg Syrel
◽
Ali Bouaricha
◽
Mariusz Niewczas
◽
Bo Su
◽
...
Keyword(s):
Shape Correction
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CLMPC: curvilinear MPC in a mask data preparation flow
Photomask Technology
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10.1117/12.2282502
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2017
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Author(s):
Malavika Sharma
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Ingo Bork
◽
Bhardwaj Durvasula
◽
Nageswara Rao
◽
Peter Buck
◽
...
Keyword(s):
Data Preparation
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The impact of inconsistency in assist feature generation on OPC performance
Photomask Technology
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10.1117/12.2281968
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2017
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Cited By ~ 1
Author(s):
Amr Y. Abdo
◽
Ramya Viswanathan
◽
Donald J. Samuels
◽
David Conklin
Keyword(s):
Feature Generation
◽
The Impact
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Advanced photomask chrome etch: selectivity without sacrifice
Photomask Technology
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10.1117/12.2281439
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2017
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Author(s):
Michael Morgan
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Kristen Bevlin
◽
Dwarakanath Geerpuram
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Russell J. Westerman
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Chris Johnson
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EUV optical characterization of alternative membrane materials for EUV pellicles
Photomask Technology
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10.1117/12.2280553
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2017
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Cited By ~ 2
Author(s):
Frank Scholze
◽
Christian Laubis
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Marina Y. Timmermans
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Ivan Pollentier
◽
Emily E. Gallagher
◽
...
Keyword(s):
Optical Characterization
◽
Membrane Materials
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Extending the era of Moore's Law
Photomask Technology
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10.1117/12.2286671
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2017
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Author(s):
Tsu-Jae King Liu
Keyword(s):
Moore’S Law
◽
Moore's Law
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Automatic SRAF printing detection based on contour extraction
Photomask Technology
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10.1117/12.2280186
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2017
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Cited By ~ 2
Author(s):
Liang Cao
◽
Jie Zhang
◽
Wenchao Jiang
◽
Dong Qing Zhang
◽
Wei-long Wang
◽
...
Keyword(s):
Contour Extraction
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