Design-Process-Technology Co-optimization for Manufacturability XIV
Latest Publications

TOTAL DOCUMENTS

40

(FIVE YEARS 40)

H-INDEX

1

(FIVE YEARS 1)

Published By SPIE

9781510634237, 9781510634244

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Implementing Machine Learning OPC on product layouts

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2552398 ◽

2020 ◽

Author(s):

Hesham Abdelghany ◽

Kevin Hooker ◽

Marco Guajardo ◽

Chia-Chun Lu

Keyword(s):

Machine Learning

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Implementing Machine Learning for OPC retargeting

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2552402 ◽

2020 ◽

Author(s):

Kevin Hooker ◽

Marco Guajardo ◽

Nai-Chia Cheng ◽

Guangming Xiao

Keyword(s):

Machine Learning

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A comparative analysis of EUV sheet and gate patterning for beyond 7nm gate all around stacked nanosheet FET’s (Conference Presentation)

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2552159 ◽

2020 ◽

Author(s):

Indira Seshadri ◽

Praveen Joseph ◽

Stuart A. Sieg ◽

Tao Li ◽

Wenyu Xu ◽

...

Keyword(s):

Comparative Analysis

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Holistic method for reducing overlay error at the 5nm node and beyond

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2554799 ◽

2020 ◽

Author(s):

Robert Socha

Keyword(s):

Holistic Method

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Progression of Logic Device and DTCO to enable advance scaling (Conference Presentation)

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2551690 ◽

2020 ◽

Author(s):

Satadru Sarkar ◽

Bilal Chehab ◽

Julien Ryckaert ◽

Myung Hee Na ◽

Alessio Spessot

Keyword(s):

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Concurrent design rule, OPC and process optimization in EUV Lithography (Conference Presentation)

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2553212 ◽

2020 ◽

Author(s):

Dongbo Xu ◽

Werner Gillijns ◽

Ling Ee Tan ◽

Jae Uk Lee ◽

Ryoung-Han Kim

Keyword(s):

Process Optimization ◽

Design Rule ◽

Concurrent Design ◽

Euv Lithography

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Multi-varied implementations with common underpinnings in design technology co-optimization

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2553656 ◽

2020 ◽

Author(s):

Kevin Lucas ◽

Victor Moroz ◽

John Kim ◽

Soo-Han Choi ◽

Tim Tsuei

Keyword(s):

Design Technology

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Unsupervised machine learning based CD-SEM image segregator for OPC and process window estimation

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2552055 ◽

2020 ◽

Author(s):

Bappaditya Dey ◽

Dorin Cerbu ◽

Kasem Khalil ◽

Sandip Halder ◽

Philippe Leray ◽

...

Keyword(s):

Machine Learning ◽

Process Window ◽

Unsupervised Machine Learning ◽

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An automated system for checking process friendliness and routability of standard cells

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2551981 ◽

2020 ◽

Author(s):

I-Lun Tseng ◽

Punitha Selvam ◽

Zhao Chuan Lee ◽

Vikas Tripathi ◽

Chun Ming Yip ◽

...

Keyword(s):

Automated System ◽

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Machine Learning using retarget data to improve accuracy of fast lithographic hotspot detection

Design-Process-Technology Co-optimization for Manufacturability XIV ◽

10.1117/12.2551827 ◽

2020 ◽

Author(s):

Aliaa Kabeel ◽

Wael ElManhawy ◽

Joe Kwan ◽

Asmaa Rabie ◽

Mohamed Ismail ◽

...

Keyword(s):

Machine Learning ◽

Hotspot Detection ◽

Improve Accuracy

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