Design-Process-Technology Co-optimization for Manufacturability XIV
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9781510634237, 9781510634244
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Implementing Machine Learning OPC on product layouts

2020 ◽  
Author(s):  
Hesham Abdelghany ◽  
Kevin Hooker ◽  
Marco Guajardo ◽  
Chia-Chun Lu
Keyword(s):  
Machine Learning

Implementing Machine Learning for OPC retargeting

2020 ◽  
Author(s):  
Kevin Hooker ◽  
Marco Guajardo ◽  
Nai-Chia Cheng ◽  
Guangming Xiao
Keyword(s):  
Machine Learning

A comparative analysis of EUV sheet and gate patterning for beyond 7nm gate all around stacked nanosheet FET’s (Conference Presentation)

2020 ◽  
Author(s):  
Indira Seshadri ◽  
Praveen Joseph ◽  
Stuart A. Sieg ◽  
Tao Li ◽  
Wenyu Xu ◽  
...  
Keyword(s):  
Comparative Analysis

Progression of Logic Device and DTCO to enable advance scaling (Conference Presentation)

2020 ◽  
Author(s):  
Satadru Sarkar ◽  
Bilal Chehab ◽  
Julien Ryckaert ◽  
Myung Hee Na ◽  
Alessio Spessot
Keyword(s):  
Logic Device

Concurrent design rule, OPC and process optimization in EUV Lithography (Conference Presentation)

2020 ◽  
Author(s):  
Dongbo Xu ◽  
Werner Gillijns ◽  
Ling Ee Tan ◽  
Jae Uk Lee ◽  
Ryoung-Han Kim
Keyword(s):  
Process Optimization ◽  
Design Rule ◽  
Concurrent Design ◽  
Euv Lithography

Multi-varied implementations with common underpinnings in design technology co-optimization

2020 ◽  
Author(s):  
Kevin Lucas ◽  
Victor Moroz ◽  
John Kim ◽  
Soo-Han Choi ◽  
Tim Tsuei
Keyword(s):  
Design Technology

Unsupervised machine learning based CD-SEM image segregator for OPC and process window estimation

2020 ◽  
Author(s):  
Bappaditya Dey ◽  
Dorin Cerbu ◽  
Kasem Khalil ◽  
Sandip Halder ◽  
Philippe Leray ◽  
...  
Keyword(s):  
Machine Learning ◽  
Process Window ◽  
Unsupervised Machine Learning ◽  
Sem Image

An automated system for checking process friendliness and routability of standard cells

2020 ◽  
Author(s):  
I-Lun Tseng ◽  
Punitha Selvam ◽  
Zhao Chuan Lee ◽  
Vikas Tripathi ◽  
Chun Ming Yip ◽  
...  
Keyword(s):  
Automated System ◽  
Standard Cells

Machine Learning using retarget data to improve accuracy of fast lithographic hotspot detection

2020 ◽  
Author(s):  
Aliaa Kabeel ◽  
Wael ElManhawy ◽  
Joe Kwan ◽  
Asmaa Rabie ◽  
Mohamed Ismail ◽  
...  
Keyword(s):  
Machine Learning ◽  
Hotspot Detection ◽  
Improve Accuracy
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