A comparative analysis of EUV sheet and gate patterning for beyond 7nm gate all around stacked nanosheet FET’s (Conference Presentation)

Author(s):  
Indira Seshadri ◽  
Praveen Joseph ◽  
Stuart A. Sieg ◽  
Tao Li ◽  
Wenyu Xu ◽  
...  
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2007 ◽  
Vol 177 (4S) ◽  
pp. 398-398
Author(s):  
Luis H. Braga ◽  
Joao L. Pippi Salle ◽  
Sumit Dave ◽  
Sean Skeldon ◽  
Armando J. Lorenzo ◽  
...  
Keyword(s):  

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