2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
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9781509002702
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

A case study on inline defect diagnosis by applying e-beam inspection system

2016 ◽  
Author(s):  
Hao-Yu Chien ◽  
Chan-Hao Hsu ◽  
Yue-Ying Yen ◽  
Tzung-Hua Ying
Keyword(s):  
Inspection System ◽  
Defect Diagnosis

Optimized circuit design and novel Al deposition process cure power short failure caused by Al whisker

2016 ◽  
Author(s):  
Y. W. Ma ◽  
Chien Hsin Lai ◽  
Zhi Min Zhang ◽  
Wei Liang Huang ◽  
Chao Yong Li ◽  
...  
Keyword(s):  
Circuit Design ◽  
Deposition Process

Impact of FOUP environment on product yield in advanced technologies

2016 ◽  
Author(s):  
Sara Case ◽  
Stephanie Waite ◽  
John Barker ◽  
Wei Zhao ◽  
Jong Soo Kim ◽  
...  
Keyword(s):  
Product Yield ◽  
Advanced Technologies

Logic characterization vehicle design for yield learning

2016 ◽  
Author(s):  
Ben Niewenhuis ◽  
Zeye Dexter Liu ◽  
Soumya Mittal ◽  
R. D. Shawn Blanton
Keyword(s):  
Vehicle Design ◽  
Yield Learning ◽  
Design For Yield

The use of CGS technology in a 3D manufacturing environment

2016 ◽  
Author(s):  
Jeffrey Mileham ◽  
David M. Owen ◽  
Doug Anberg ◽  
Yasushi Tanaka
Keyword(s):  
Manufacturing Environment

AMHS design for reticles in photolithography area of an existing wafer fab: IE: Industrial engineering

2016 ◽  
Author(s):  
Ali Ben-Salem ◽  
Claude Yugma ◽  
Emmanuel Troncet ◽  
Jacques Pinaton
Keyword(s):  
Industrial Engineering ◽  
Wafer Fab

Detection of printable EUV mask absorber defects and defect adders by full chip optical inspection of EUV patterned wafers

2016 ◽  
Author(s):  
Luciana Meli ◽  
Scott D. Halle ◽  
Ravi Bonam ◽  
Nelson Felix ◽  
Kaushik Vemareddy
Keyword(s):  
Patterned Wafers ◽  
Optical Inspection
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