Semiconductor Fabrication: Technology and Metrology
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Published By ASTM International

9780803112735
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Effect of Pre- and Post-Epitaxial Annealing on Oxygen Precipitation and Internal Gettering in N/N

2008 ◽  
pp. 371-371-16
Author(s):  
W Wijaranakula ◽  
S Shimada ◽  
H Mollenkopf ◽  
JH Matlock ◽  
M Stuber
Keyword(s):  
Oxygen Precipitation

Plasma Etching of Aluminum Alloys in BCL

2008 ◽  
pp. 202-202-10
Author(s):  
C-H Chen ◽  
S DeOrnellas ◽  
B Burke
Keyword(s):  
Aluminum Alloys ◽  
Plasma Etching

Dry Etching of Ion Implanted Silicon: Electrical Effects

2008 ◽  
pp. 174-174-8
Author(s):  
JM Heddleson ◽  
MW Horn ◽  
SJ Fonash
Keyword(s):  
Dry Etching ◽  
Ion Implanted
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