Neutron Transmutation Doping of Semiconductor Materials
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Published By Springer US

9781461296751, 9781461326953

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Process Induced Recombination Centres in Neutron Transmutation Doped Silicon and their Influence on High-Voltage Direct-Current Thyristors

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_13 ◽

1984 ◽

pp. 181-191 ◽

Cited By ~ 2

Author(s):

D. E. Crees ◽

P. D. Taylor

Keyword(s):

High Voltage ◽

Direct Current ◽

High Voltage Direct Current ◽

Doped Silicon ◽

Neutron Transmutation

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The Development of NTD Technology in the Institute of Atomic Energy

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_8 ◽

1984 ◽

pp. 115-126

Author(s):

Cao Yizheng ◽

Gao Jijin

Keyword(s):

Atomic Energy

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Future Reactor Capacity for the Irradiation of Silicon

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_5 ◽

1984 ◽

pp. 83-90

Author(s):

T. G. G. Smith

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Annealing Effects of NTD Silicon on High-Power Devices

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_23 ◽

1984 ◽

pp. 305-309

Author(s):

C. K. Chu ◽

J. E. Johnson

Keyword(s):

High Power ◽

Power Devices ◽

Annealing Effects

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The Development of the Market for Neutron Transmutation Doped Silicon

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_11 ◽

1984 ◽

pp. 157-165 ◽

Cited By ~ 1

Author(s):

Heinz Herzer ◽

Fritz G. Vieweg-Gutberlet

Keyword(s):

Doped Silicon ◽

Neutron Transmutation

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An Automatic Controlled, Heavy Water Cooled Facility for Irradiation of Silicon Crystals in the DR 3 Reactor at Risø National Laboratory, Denmark

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_6 ◽

1984 ◽

pp. 91-102

Author(s):

K. Hansen ◽

K. Stendal ◽

K. Andresen ◽

K. Heydorn

Keyword(s):

Heavy Water ◽

National Laboratory ◽

Silicon Crystals

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Swirls in Neutron-Transmutation Doped Float-Zoned Silicon

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_18 ◽

1984 ◽

pp. 251-260

Author(s):

Horst G. Kramer

Keyword(s):

Neutron Transmutation

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Neutron Transmutation Doping of p-Type Czochralski-Grown Gallium Arsenide

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_1 ◽

1984 ◽

pp. 1-20 ◽

Cited By ~ 3

Author(s):

M. H. Young ◽

A. T. Hunter ◽

R. Baron ◽

O. J. Marsh ◽

H. V. Winston ◽

...

Keyword(s):

Gallium Arsenide ◽

Neutron Transmutation Doping ◽

Transmutation Doping ◽

Neutron Transmutation ◽

P Type

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Annealing Study of NTD Silicon Doped with Boron

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_22 ◽

1984 ◽

pp. 297-303

Author(s):

Jeffrey B. Watson ◽

B. C. Covington

Keyword(s):

Annealing Study ◽

Silicon Doped

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A Detailed Annealing Study of NTD Silicon Utilizing Raman Scattering

Neutron Transmutation Doping of Semiconductor Materials ◽

10.1007/978-1-4613-2695-3_21 ◽

1984 ◽

pp. 287-295

Author(s):

H. R. Chandrasekhar ◽

Meera Chandrasekhar ◽

J. M. Meese ◽

S. L. Thaler

Keyword(s):

Raman Scattering ◽

Annealing Study

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Neutron Transmutation Doping of Semiconductor MaterialsLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Springer US

Process Induced Recombination Centres in Neutron Transmutation Doped Silicon and their Influence on High-Voltage Direct-Current Thyristors

The Development of NTD Technology in the Institute of Atomic Energy

Future Reactor Capacity for the Irradiation of Silicon

Annealing Effects of NTD Silicon on High-Power Devices

The Development of the Market for Neutron Transmutation Doped Silicon

An Automatic Controlled, Heavy Water Cooled Facility for Irradiation of Silicon Crystals in the DR 3 Reactor at Risø National Laboratory, Denmark

Swirls in Neutron-Transmutation Doped Float-Zoned Silicon

Neutron Transmutation Doping of p-Type Czochralski-Grown Gallium Arsenide

Annealing Study of NTD Silicon Doped with Boron

A Detailed Annealing Study of NTD Silicon Utilizing Raman Scattering

Neutron Transmutation Doping of Semiconductor Materials
Latest Publications