Ion Implantation Technology–92
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147
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Published By Elsevier

9780444899941
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Density deviations of sheet plasma

1993 ◽  
pp. 691-694
Author(s):  
Katsuhiko Sunako ◽  
Kenzo Nanri ◽  
Kazutaka Kawamura ◽  
Kazuo Takayama
Keyword(s):  
Sheet Plasma

PRODUCTION OF LARGE VOLUME CYLINDRICAL RF PLASMA USING CIRCULAR MAGNETIC LINE CUSP FIELD

1993 ◽  
pp. 683-686 ◽  
Author(s):  
K. YAMAUCHI ◽  
M. SHIBAGAKI ◽  
A. KONO ◽  
K. TAKAHASHI ◽  
T. SHEBUYA ◽  
...  
Keyword(s):  
Large Volume ◽  
Rf Plasma ◽  
Magnetic Line

PRODUCTION OF RF SLAB PLASMA USING RECTANGULAR MAGNETIC LINE CUSP FIELD

1993 ◽  
pp. 679-682 ◽  
Author(s):  
K. TAKAHASHI ◽  
S. HASHIMOTO ◽  
E. YABE ◽  
K. TAKAYAMA ◽  
K. YAMAUCHI
Keyword(s):  
Magnetic Line

Wafer Charge Control in the E1000 Ion Implanter

1993 ◽  
pp. 635-639 ◽  
Author(s):  
Shu Satoh ◽  
Daniel F. Downey ◽  
Reuel B. Liebert ◽  
Susan Felch
Keyword(s):  
Charge Control

Comparison of Charge-up Phenomena between Negative- and Positive-Ion Implantations

1993 ◽  
pp. 617-620 ◽  
Author(s):  
S. Sakai ◽  
M. Tanjyo ◽  
K. Matsuda ◽  
Y. Gotoh ◽  
H. Ohnishi ◽  
...  
Keyword(s):  
Positive Ion

Considerations For Advanced Charging Solutions Applied to ULSI Device Fabrication

1993 ◽  
pp. 609-612 ◽  
Author(s):  
H. Ito ◽  
F. Plumb ◽  
J. England ◽  
I. Fotheringham ◽  
P. Kindersley
Keyword(s):  
Device Fabrication

Computer Controlled Beam Diagnostics

1993 ◽  
pp. 483-486
Author(s):  
I. Krafcsik ◽  
L. Farkas ◽  
A. Zimmer ◽  
C. Rossi ◽  
A. Fabris ◽  
...  
Keyword(s):  
Beam Diagnostics ◽  
Computer Controlled
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