1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314)
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Production technology of high performance slurry without CMP dispersing agent

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808830 ◽

2003 ◽

Author(s):

Y. Karasawa ◽

K. Murase ◽

T. Yamaguchi ◽

K. Watanabe ◽

T.K. Doy

Keyword(s):

Production Technology ◽

High Performance ◽

Dispersing Agent

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The use of ozonated water as resist strip and post ash clean in a production fab

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808763 ◽

2003 ◽

Author(s):

R. Vroom ◽

S. De Gendt

Keyword(s):

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A framework for extracting defect density information for yield modeling from in-line defect inspection for real-time prediction of random defect limited yields

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808821 ◽

2003 ◽

Author(s):

J. Segal ◽

A. Gordon ◽

D. Sajoto ◽

B. Duffy ◽

M. Kumar

Keyword(s):

Real Time ◽

Defect Density ◽

Line Defect ◽

Defect Inspection ◽

Time Prediction ◽

Yield Modeling ◽

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Modeling yield throughout the DRAM product life cycle

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808753 ◽

2003 ◽

Author(s):

S. Simmons

Keyword(s):

Product Life Cycle ◽

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Improvement of production logistics for backend manufacturing

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808743 ◽

2003 ◽

Author(s):

G. Winz ◽

J. Potoradi ◽

Pang Tong Lim

Keyword(s):

Production Logistics

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Yield impact of cross-field and cross-wafer CD spatial uniformity: collapse of the deep-UV and 193 nm lithographic focus window

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808751 ◽

2003 ◽

Author(s):

K. Monahan ◽

P. Lord ◽

W. Ng ◽

H. Altendorfer ◽

G. Kren ◽

...

Keyword(s):

Spatial Uniformity ◽

Deep Uv ◽

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Combined x-ray tool for process control of compound dielectric films

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808812 ◽

2003 ◽

Author(s):

S. Terada

Keyword(s):

Process Control ◽

Dielectric Films ◽

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The development of batch type low pressure spin dryer for water mark-less wafers

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808833 ◽

2003 ◽

Author(s):

K. Maeda ◽

H. Okuchi ◽

S. Nadahara ◽

K. Okumura ◽

Y. Muraoka

Keyword(s):

Low Pressure ◽

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A new gas circulation RIE

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808785 ◽

2003 ◽

Author(s):

T. Ohiwa ◽

I. Sakai ◽

K. Okumura

Keyword(s):

Gas Circulation

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Practical use of CMP process monitor in Cu polishing

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314) ◽

10.1109/issm.1999.808768 ◽

2003 ◽

Author(s):

T. Kojima ◽

M. Miyajima ◽

F. Akaboshi ◽

T. Yogo ◽

S. Ishimoto

Keyword(s):

Process Monitor

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