2006 IEEE International Symposium on Semiconductor Manufacturing
Latest Publications

TOTAL DOCUMENTS

161

(FIVE YEARS 0)

H-INDEX

5

(FIVE YEARS 0)

Published By IEEE

9784990413804

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Fab-wide equipment monitoring and FDC system

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493037 ◽

2006 ◽

Author(s):

Shin-ichi Imai ◽

Naoaki Sato ◽

Masaki Kitabata ◽

Satoshi Yasuda

Keyword(s):

Equipment Monitoring

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Integrated Production Control System in Managing Tool Uptime, Cycle-time and Capacity

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493083 ◽

2006 ◽

Author(s):

Chan Chih Ming ◽

Tan Pei Ling ◽

Muralitharan Subramaniam ◽

Ong Soon Guan

Keyword(s):

Control System ◽

Production Control ◽

Integrated Production ◽

Production Control System

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Method of Minimizing Inspection Cost by Making Use of Programmed Defect Array

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493010 ◽

2006 ◽

Author(s):

Takahide Hayano ◽

Amy Tu ◽

Bryon Hance ◽

Samantha Doan ◽

Stacy Sakai ◽

...

Keyword(s):

Inspection Cost

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Conveyer Belt Model to Analyze Cycle Time Conditions in a Semiconductor Manufacturing Line

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493026 ◽

2006 ◽

Author(s):

Toshikazu Inoue ◽

Yoshio Ishii ◽

Kouichi Igarashi ◽

Hideo Takagi ◽

Taka Muneta ◽

...

Keyword(s):

Semiconductor Manufacturing ◽

Conveyer Belt ◽

Manufacturing Line

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Application of Atmospheric Plasma Abatement System for Exhausted Gas from MEMS Etching Process

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493017 ◽

2006 ◽

Author(s):

Kenji Hattori ◽

Kazuhiko Sakurai ◽

Nobuaki Watanabe ◽

Hirotaka Mangyou ◽

Satoshi Hasaka ◽

...

Keyword(s):

Etching Process ◽

Atmospheric Plasma

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Environmentally Friendly Single-Wafer Spin Cleaning Using Ultra-diluted HF/Nitrogen Jet Spray without Causing Structural Damage and Material Loss

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493051 ◽

2006 ◽

Author(s):

Hideki Hirano ◽

Kou Sato ◽

Tsutomu Osaka ◽

Hitoshi Kuniyasu ◽

Takeshi Hattori

Keyword(s):

Structural Damage ◽

Environmentally Friendly ◽

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Distributive and Cooperative Scheduling Considering Multi-Attribute Product-Mix, Feedback Process, and the Dynamic Utility Control-in Resource Sharing

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493075 ◽

2006 ◽

Author(s):

Sumika Arima ◽

Yuta Sato ◽

Tomoya Saitou ◽

Randall Perez ◽

Yoshihiro Ishii ◽

...

Keyword(s):

Resource Sharing ◽

Feedback Process ◽

Product Mix ◽

Cooperative Scheduling

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The CASMAT Business Model for Semiconductor Materials

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493002 ◽

2006 ◽

Author(s):

Yoshifumi Kawamoto

Keyword(s):

Business Model ◽

Semiconductor Materials

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Managing Dynamic Events in Full-Load States of Semiconductor Manufacturing Chains

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493144 ◽

2006 ◽

Author(s):

Hsin-Yi Huang ◽

Sherman Chang ◽

Jun-Wei Chen ◽

Yon-Chun Chou

Keyword(s):

Semiconductor Manufacturing ◽

Full Load ◽

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Collaboration in the 21st Century: Driving-Innovation and Differentiation

2006 IEEE International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2006.4493001 ◽

2006 ◽

Author(s):

Song Hwee Chia

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