Fabrication and Characterization of ALD-grown ZrO2:Ge Thin Films on Si(1 0 0) using CpZr(NMe2)3and (NMe2)2Ge(ipr2en) Precursors with Ozone
2004 ◽
Vol 58
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pp. 2045-2048
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2014 ◽
Vol 10
(3)
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pp. 579-584
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2012 ◽
Vol 30
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pp. 198-201
1995 ◽
Vol 87
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pp. 823-827
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2010 ◽
Vol 40
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pp. 85-91
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